公开(公告)号：US20070176128A1

公开(公告)日：2007-08-02

申请号：US11643772

申请日：2006-12-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060086910A1

公开(公告)日：2006-04-27

申请号：US11294367

申请日：2005-12-06

申请人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.