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    Opto-electrical ultrasound sensor and system
    3.
    发明授权
    Opto-electrical ultrasound sensor and system 有权
    光电超声波传感器和系统

    公开(公告)号：US09155517B2

    公开(公告)日：2015-10-13

    申请号：US12669015

    申请日：2008-07-01

    申请人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

    发明人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

    IPC分类号： A61B8/14 ,  A61B8/00 ,  G01H9/00 ,  G01S7/52 ,  G01S15/89 ,  A61B5/00

    CPC分类号： A61B8/00 ,  A61B5/0066 ,  A61B5/0097 ,  G01H9/00 ,  G01S7/52033 ,  G01S7/52079 ,  G01S15/8968

    摘要： An opto-electrical ultrasound sensor, preferably for the use in medical diagnostics, comprising at least one light source (2), a photo detector (3) illuminated by the light source (2) and capable of producing an electrical signal indicative of the intensity of the light incident on the photo detector (3), and an optical ultrasound detector (4) located in the optical path between the light source (2) and the photo detector (3) and capable of modulating in response to an ultrasound signal the intensity of at least part of the light incident on photo detector (3) from the light source (2). The opto-electrical ultrasound sensor further comprises intensity adjustment means (5) for adjusting the intensity of the light incident on the photo detector (3) via the optical ultrasound detector (4).

    摘要翻译： 一种优选用于医疗诊断的光电超声波传感器，包括由光源（2）照射的至少一个光源（2），光电检测器（3），并且能够产生指示强度的电信号 的入射光检测器（3）的光，和位于光源（2）和光电检测器（3）之间的光路中的光学超声波检测器（4），并且能够响应于超声信号进行调制 从光源（2）入射到光检测器（3）上的光的至少一部分的强度。 光电超声波传感器还包括用于经由光学超声波检测器（4）调节入射在光检测器（3）上的光的强度的强度调节装置（5）。

    Method for position determination, method for overlay optimization, and lithographic projection apparatus
    5.
    发明申请
    Method for position determination, method for overlay optimization, and lithographic projection apparatus 失效
    位置确定方法，重叠优化方法和光刻投影仪

    公开(公告)号：US20050133743A1

    公开(公告)日：2005-06-23

    申请号：US10736911

    申请日：2003-12-17

    申请人： Sicco Schets ,  Jeroen Huijbregstse ,  Allan Dunbar ,  Nicolaas Van Der Aa

    发明人： Sicco Schets ,  Jeroen Huijbregstse ,  Allan Dunbar ,  Nicolaas Van Der Aa

    IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

    CPC分类号： G03F7/70633

    摘要： A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.

    摘要翻译： 一种用于优化光刻投影设备的对准状​​态的方法。 该方法包括将辐射束投射在基板的目标部分上并测量由目标部分发射的多个衍射信号。 该方法还包括计算多个衍射信号中的每一个的方差，使得​​确定衍射信号的多个方差，并且基于多个方差的分析来调整光刻投影设备的对准状​​态。

    Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
    7.
    发明申请
    Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效
    光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件

    公开(公告)号：US20050147902A1

    公开(公告)日：2005-07-07

    申请号：US11007578

    申请日：2004-12-09

    申请人： Maurits Van Der Schaar ,  Jeroen Huijbregtse ,  Sicco Schets ,  Bart Swinnen

    发明人： Maurits Van Der Schaar ,  Jeroen Huijbregtse ,  Sicco Schets ,  Bart Swinnen

    IPC分类号： G03F9/00 ,  G03B27/00 ,  G03C5/00 ,  G03C8/00 ,  H01L21/027 ,  H01L21/68

    CPC分类号： G03F9/7092

    摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.

    摘要翻译： 根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 物体可以包括多个对准标记，其中期望的位置是已知的。 该方法包括测量每个对准标记的多个位置参数。 基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。 每个称重系数的数值与模型的至少一个参数一起确定。

    Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
    8.
    发明申请
    Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效
    光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件

    公开(公告)号：US20050123843A1

    公开(公告)日：2005-06-09

    申请号：US10730254

    申请日：2003-12-09

    申请人： Maurits Schaar ,  Jeroen Huijbregtse ,  Sicco Schets ,  Bart Swinnen

    发明人： Maurits Schaar ,  Jeroen Huijbregtse ,  Sicco Schets ,  Bart Swinnen

    IPC分类号： G03F9/00 ,  G03B27/00 ,  G03C5/00 ,  G03C8/00 ,  H01L21/027 ,  H01L21/68

    CPC分类号： G03F9/7092

    摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.

    摘要翻译： 根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 物体具有多个已知位置的对准标记。 该方法包括测量每个对准标记的多个位置参数。 基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。 每个称重系数的数值与模型的至少一个参数一起确定。

    OPTO-ELECTRICAL ULTRASOUND SENSOR AND SYSTEM
    9.
    发明申请
    OPTO-ELECTRICAL ULTRASOUND SENSOR AND SYSTEM 有权
    光电超声波传感器和系统

    公开(公告)号：US20100210950A1

    公开(公告)日：2010-08-19

    申请号：US12669015

    申请日：2008-07-01

    申请人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

    发明人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

    IPC分类号： A61B8/00

    CPC分类号： A61B8/00 ,  A61B5/0066 ,  A61B5/0097 ,  G01H9/00 ,  G01S7/52033 ,  G01S7/52079 ,  G01S15/8968

    摘要： An opto-electrical ultrasound sensor, preferably for the use in medical diagnostics, comprising at least one light source (2),a photo detector (3) illuminated by the light source (2) and capable of producing an electrical signal indicative of the intensity of the light incident on the photo detector(3), and an optical ultrasound detector (4) located in the optical path between the light source (2) and the photo detector (3) and capable of modulating in response to an ultrasound signal the intensity of at least part of the light incident on photo detector (3) from the light source (2). The opto-electrical ultrasound sensor further comprises intensity adjustment means (5) for adjusting the intensity of the light incident on the photo detector (3) via the optical ultrasound detector (4).

    摘要翻译： 一种优选用于医疗诊断的光电超声波传感器，包括由光源（2）照射的至少一个光源（2），光电检测器（3），并且能够产生指示强度的电信号 的入射光检测器（3）的光，和位于光源（2）和光电检测器（3）之间的光路中的光学超声波检测器（4），并且能够响应于超声信号进行调制 从光源（2）入射到光检测器（3）上的光的至少一部分的强度。 光电超声波传感器还包括用于经由光学超声波检测器（4）调节入射在光检测器（3）上的光的强度的强度调节装置（5）。