摘要:
A semiconductor device (10) includes a lead frame (12) having tie bars (16). In one form of the invention, the tie bars are used to support a semiconductor die (20) to alleviate package cracking problems caused by stress and to provide a universal lead frame which is suitable for use with many different die sizes. In another embodiment, a semiconductor device (45) includes a lead frame (40) having a mini-flag (42) to accomplish these same objectives.
摘要:
A semiconductor device (10) includes a lead frame (12) having tie bars (16). In one form of the invention, the tie bars are used to support a semiconductor die (20) to alleviate package cracking problems caused by stress and to provide a universal lead frame which is suitable for use with many different die sizes. In another embodiment, a semiconductor device (45) includes a lead frame (40) having a mini-flag (42) to accomplish these same objectives.
摘要:
A non-destructive method of determining substrate tilt within a packaged component includes providing the packaged component (10) with a component surface (32), providing a substrate (22) in the packaged component (10) wherein the substrate (22) has a substrate surface (33), using an acoustic wave (50) to measure a distance (34) between the component surface (32) and a region on the substrate surface (33), using another acoustic wave (53) to measure another distance (35) between the component surface (32) and a different region on the substrate surface (33), and comparing the distances (34, 35) to a threshold value.
摘要:
A method for determining the cleanliness of a surface of a substrate involves using a visual pattern (17, 29). The visual pattern is either provided in the optical portion of a visual system or is formed on the surface of the substrate to be analyzed. A liquid droplet (26, 27) is dispensed onto the substrate surface, and the extent of the spread area of the droplet is compared to the visual pattern. If the area of the droplet is greater than or equal to a tolerance as signified by the pattern markings, then the surface of the substrate is determined to be sufficiently clean. In relying upon a simple visual comparison of the area of the surface covered by the droplet with an empirically determined visual pattern, a method for analyzing surface cleanliness is consistent between operators and surfaces, is easy to set up and operate, and improves manufacturing throughput.