公开(公告)号：US20140055024A1

公开(公告)日：2014-02-27

申请号：US13591291

申请日：2012-08-22

Applicant: Frank Goerbing

Inventor： Frank Goerbing

IPC: H01J27/02 ,  H01L21/425

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/317 ,  H01J37/3171 ,  H01L21/265

Abstract: An ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing ionizable gas into the chamber, and an arc slit for extracting ions from the chamber. The chamber includes an electrically conductive ceramic.

Abstract translation: 离子源包括限定用于电离的内腔的腔室，在内腔的第一端处的电子束源，用于将可电离气体引入腔室的入口和用于从腔室中提取离子的弧缝。 该腔室包括导电陶瓷。

公开(公告)号：US09257285B2

公开(公告)日：2016-02-09

申请号：US13591291

申请日：2012-08-22

Applicant: Frank Goerbing

Inventor： Frank Goerbing

IPC: H01J17/26 ,  H01J61/28 ,  H01J1/14 ,  H01L21/265 ,  H01J37/08 ,  H01J37/317 ,  H01J27/08

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/317 ,  H01J37/3171 ,  H01L21/265

Abstract: An ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing ionizable gas into the chamber, and an arc slit for extracting ions from the chamber. The chamber includes an electrically conductive ceramic.

Abstract translation: 离子源包括限定用于电离的内腔的腔室，在内腔的第一端处的电子束源，用于将可电离气体引入腔室的入口和用于从腔室中提取离子的弧缝。 该腔室包括导电陶瓷。