公开(公告)号：US3537847A

公开(公告)日：1970-11-03

申请号：US3537847D

申请日：1968-10-22

Applicant: GEN DYNAMICS CORP

Inventor： HOTINE WILLIAM

IPC: C23C14/04 ,  C23C18/16 ,  H05K3/14 ,  H05K3/18 ,  G03G13/00 ,  G03G13/22

CPC classification number: C23C18/1605 ,  C23C14/04 ,  C23C18/1669 ,  H05K3/1266 ,  H05K3/146 ,  H05K3/182 ,  H05K2203/0517

公开(公告)号：US3514847A

公开(公告)日：1970-06-02

申请号：US3514847D

申请日：1968-10-22

Applicant: GEN DYNAMICS CORP

Inventor： HOTINE WILLIAM

IPC: H05K3/14 ,  H05K3/18 ,  H01L15/02

CPC classification number: H05K3/146 ,  H05K3/1266 ,  H05K3/182 ,  H05K2203/0517

公开(公告)号：US3575504A

公开(公告)日：1971-04-20

申请号：US3575504D

申请日：1966-05-10

Applicant: GEN DYNAMICS CORP

Inventor： HOTINE WILLIAM

IPC: G03G5/10 ,  G03G15/22 ,  G03G15/10

CPC classification number: G03G15/22 ,  C23C18/1619 ,  G03G5/10 ,  H05K3/1266 ,  H05K2203/0517

Abstract: An electrostatically controlled maskless vapor plating system for deposition of an electroless plating solution on an insulating substrate by means of a photoconductive matrix which is specifically fabricated to have the necessary properties for the generation of an electrostatic analogy of a visible pattern.

公开(公告)号：US3435222A

公开(公告)日：1969-03-25

申请号：US3435222D

申请日：1966-03-25

Applicant: GEN DYNAMICS CORP

Inventor： HOTINE WILLIAM

IPC: H01J40/12 ,  G01T1/16

CPC classification number: H01J40/12