公开(公告)号：US11586032B2

公开(公告)日：2023-02-21

申请号：US16435986

申请日：2019-06-10

Applicant: Gigaphoton Inc.

Inventor： Hiroyuki Ito ,  Hiroshi Tanaka

IPC: H05G2/00 ,  H01S3/00 ,  G02B26/08 ,  G02B27/10 ,  G02B27/14 ,  H01S3/223 ,  H01S3/23 ,  H01S3/10 ,  B23K26/00

Abstract: A laser apparatus may include: a mirror configured to reflect a laser beam; an actuator configured to operate the mirror; and a controller configured to transmit a movement instruction to the actuator, wherein the controller predicts a movement completion time of the actuator, and transmits a polling signal so that the actuator receives the polling signal after expiration of the predicted movement completion time.

公开(公告)号：US09622332B2

公开(公告)日：2017-04-11

申请号：US14061295

申请日：2013-10-23

Applicant: GIGAPHOTON INC.

Inventor： Toru Suzuki ,  Hiroshi Tanaka ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G06T7/20

CPC classification number: H05G2/008 ,  G06T7/20 ,  G06T7/246 ,  G06T2207/30241 ,  H05G2/003 ,  H05G2/006

Abstract: In an extreme ultraviolet light generation apparatus, a target detection section may include a light source, a transfer optical system, an image sensor configured to output image data of an image that has been formed by irradiating a target outputted from a target supply device with light outputted from the light source on a light-receiving unit of the image sensor by the transfer optical system, and a processing unit, connected to the image sensor, configured to receive the image data, obtain a first optical intensity distribution along a first line that intersects with a trajectory of the target and a second optical intensity distribution along a second line that intersects with the trajectory, calculate a center of gravity position in the first optical intensity distribution and a center of gravity position in the second optical intensity distribution, and calculate an actual path of the target based on the calculated positions.

公开(公告)号：US09841684B2

公开(公告)日：2017-12-12

申请号：US14629282

申请日：2015-02-23

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi Tanaka ,  Akihiko Kurosu ,  Hiroyuki Masuda ,  Hideyuki Ochiai ,  Osamu Wakabayashi ,  Masato Moriya

IPC: G03F7/20 ,  H01L21/268 ,  H01L21/67 ,  H01L21/66

CPC classification number: G03F7/70483 ,  G03F7/70041 ,  G03F7/70058 ,  G03F7/70358 ,  H01L21/268 ,  H01L21/67115 ,  H01L21/67253 ,  H01L22/10 ,  H01L22/26

Abstract: A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.