公开(公告)号：US09459797B2

公开(公告)日：2016-10-04

申请号：US14153728

申请日：2014-01-13

Applicant: GLOBALFOUNDRIES INC.

Inventor： Christos Dimitrakopoulos ,  Augustin J. Hong ,  Jeehwan Kim ,  Devendra K. Sadana ,  Kuen-Ting Shiu

IPC: H01L31/02 ,  G06F3/06 ,  H04W8/06 ,  H01L31/0236 ,  G06F11/07 ,  G06F12/02 ,  H04L29/08 ,  G06F11/10 ,  H04W8/04

CPC classification number: G06F3/061 ,  G06F3/064 ,  G06F3/0647 ,  G06F3/0653 ,  G06F3/0689 ,  G06F11/0727 ,  G06F11/1076 ,  G06F12/02 ,  H01L31/02366 ,  H04L67/1002 ,  H04W8/04 ,  H04W8/065 ,  Y02E10/50

Abstract: A method for fabricating a photovoltaic device includes applying a diblock copolymer layer on a substrate and removing a first polymer material from the diblock copolymer layer to form a plurality of distributed pores. A pattern forming layer is deposited on a remaining surface of the diblock copolymer layer and in the pores in contact with the substrate. The diblock copolymer layer is lifted off and portions of the pattern forming layer are left in contact with the substrate. The substrate is etched using the pattern forming layer to protect portions of the substrate to form pillars in the substrate such that the pillars provide a radiation absorbing structure in the photovoltaic device.

Abstract translation: 一种制造光伏器件的方法包括在基片上涂布二嵌段共聚物层，并从二嵌段共聚物层除去第一聚合物材料以形成多个分布孔。 图案形成层沉积在二嵌段共聚物层的剩余表面上和与基材接触的孔中。 剥离二嵌段共聚物层，使图案形成层的一部分与基板保持接触。 使用图案形成层蚀刻衬底以保护衬底的部分以在衬底中形成柱，使得柱在光伏器件中提供辐射吸收结构。