公开(公告)号：US10062560B1

公开(公告)日：2018-08-28

申请号：US15497647

申请日：2017-04-26

Applicant: GLOBALFOUNDRIES INC.

Inventor： Kevin J. Ryan ,  Shariq Siddiqui ,  Frank W. Mont ,  Cornelius B. Peethala

IPC: H01L21/44 ,  H01L21/02 ,  C25F1/00 ,  H01L21/768 ,  H01L21/027

CPC classification number: H01L21/76877 ,  C25F1/00 ,  H01L21/02063

Abstract: Aspects of the present disclosure provide a method of cleaning a semiconductor device. The method includes providing a semiconductor wafer having an exposed cobalt surface and rinsing the exposed cobalt surface with cathode water having a pH greater than 9 and an oxidation reduction potential of less than 0.0.