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公开(公告)号：US20190219930A1
公开(公告)日：2019-07-18
申请号：US15869150
申请日：2018-01-12
Applicant: GLOBALFOUNDRIES INC.
Inventor： Dongyue Yang , Xintuo Dai , Dongsuk Park , Minghao Tang , Md Motasim Bellah , Pavan Kumar Chinthamanipeta Sripadarao , Cheuk Wun Wong
Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.
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公开(公告)号：US10809633B1
公开(公告)日：2020-10-20
申请号：US16561702
申请日：2019-09-05
Applicant: GLOBALFOUNDRIES Inc.
Inventor： Dongyue Yang , Cheuk Wun Wong , Xintuo Dai , Sanggil Bae
IPC: G03F7/20
Abstract: Structures for detecting and correcting an overlay inaccuracy and methods of detecting and correcting an overlay inaccuracy. An overlay target includes a first plurality of features arranged along a first longitudinal axis in a first line-space pattern having a first line width, and a second plurality of features arranged along a second longitudinal axis in a second line-space pattern having a second line width that is less than the first line width. The second longitudinal axis is aligned substantially parallel to the first longitudinal axis.
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公开(公告)号：US10705435B2
公开(公告)日：2020-07-07
申请号：US15869150
申请日：2018-01-12
Applicant: GLOBALFOUNDRIES INC.
Inventor： Dongyue Yang , Xintuo Dai , Dongsuk Park , Minghao Tang , Md Motasim Bellah , Pavan Kumar Chinthamanipeta Sripadarao , Cheuk Wun Wong
Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.
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公开(公告)号：US20200241429A1
公开(公告)日：2020-07-30
申请号：US16847721
申请日：2020-04-14
Applicant: GLOBALFOUNDRIES INC.
Inventor： Dongyue Yang , Xintuo Dai , Dongsuk Park , Minghao Tang , Md Motasim Bellah , Pavan Kumar Chinthamanipeta Sripadarao , Cheuk Wun Wong
Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.
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