公开(公告)号：US10705435B2

公开(公告)日：2020-07-07

申请号：US15869150

申请日：2018-01-12

Applicant: GLOBALFOUNDRIES INC.

Inventor： Dongyue Yang ,  Xintuo Dai ,  Dongsuk Park ,  Minghao Tang ,  Md Motasim Bellah ,  Pavan Kumar Chinthamanipeta Sripadarao ,  Cheuk Wun Wong

IPC: G03F7/20 ,  G03F9/00

Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.

公开(公告)号：US10833022B2

公开(公告)日：2020-11-10

申请号：US16654354

申请日：2019-10-16

Applicant: GLOBALFOUNDRIES INC.

Inventor： Cung D. Tran ,  Huaxiang Li ,  Bradley Morgenfeld ,  Xintuo Dai ,  Sanggil Bae ,  Rui Chen ,  Md Motasim Bellah ,  Dongyue Yang ,  Minghao Tang ,  Christian J. Ayala ,  Ravi Prakash Srivastava ,  Kripa Nidhan Chauhan ,  Pavan Kumar Chinthamanipeta Sripadarao

IPC: G03F9/00 ,  G03F7/16 ,  G03F7/20 ,  H01L23/544 ,  H01L21/027 ,  H01L23/528 ,  H01L23/538

Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.

公开(公告)号：US20200051923A1

公开(公告)日：2020-02-13

申请号：US16654354

申请日：2019-10-16

Applicant: GLOBALFOUNDRIES INC.

Inventor： Cung D. Tran ,  Huaxiang Li ,  Bradley Morgenfeld ,  Xintuo Dai ,  Sanggil Bae ,  Rui Chen ,  Md Motasim Bellah ,  Dongyue Yang ,  Minghao Tang ,  Christian J. Ayala ,  Ravi Prakash Srivastava ,  Kripa Nidhan Chauhan ,  Pavan Kumar Chinthamanipeta Sripadarao

IPC: H01L23/544 ,  G03F9/00 ,  H01L21/027 ,  G03F7/16

Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.

公开(公告)号：US20190219930A1

公开(公告)日：2019-07-18

申请号：US15869150

申请日：2018-01-12

Applicant: GLOBALFOUNDRIES INC.

Inventor： Dongyue Yang ,  Xintuo Dai ,  Dongsuk Park ,  Minghao Tang ,  Md Motasim Bellah ,  Pavan Kumar Chinthamanipeta Sripadarao ,  Cheuk Wun Wong

IPC: G03F7/20 ,  G03F9/00

Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.

公开(公告)号：US20200241429A1

公开(公告)日：2020-07-30

申请号：US16847721

申请日：2020-04-14

Applicant: GLOBALFOUNDRIES INC.

Inventor： Dongyue Yang ,  Xintuo Dai ,  Dongsuk Park ,  Minghao Tang ,  Md Motasim Bellah ,  Pavan Kumar Chinthamanipeta Sripadarao ,  Cheuk Wun Wong

IPC: G03F7/20 ,  G03F9/00

Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.

公开(公告)号：US20190267329A1

公开(公告)日：2019-08-29

申请号：US15904853

申请日：2018-02-26

Applicant: GLOBALFOUNDRIES INC.

Inventor： Cung D. Tran ,  Huaxiang Li ,  Bradley Morgenfeld ,  Xintuo Dai ,  Sanggil Bae ,  Rui Chen ,  Md Motasim Bellah ,  Dongyue Yang ,  Minghao Tang ,  Christian J. Ayala ,  Ravi Prakash Srivastava ,  Kripa Nidhan Chauhan ,  Pavan Kumar Chinthamanipeta Sripadarao

IPC: H01L23/544 ,  G03F9/00 ,  G03F7/16 ,  H01L21/027

Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.