METHOD, APPARATUS AND SYSTEM FOR PROVIDING MULTIPLE EUV BEAMS FOR SEMICONDUCTOR PROCESSING
    1.
    发明申请
    METHOD, APPARATUS AND SYSTEM FOR PROVIDING MULTIPLE EUV BEAMS FOR SEMICONDUCTOR PROCESSING 审中-公开
    用于半导体处理提供多个EUV波段的方法,装置和系统

    公开(公告)号:US20170019982A1

    公开(公告)日:2017-01-19

    申请号:US14803068

    申请日:2015-07-18

    CPC classification number: H05H7/04 H05G2/00

    Abstract: At least one method, apparatus and system for providing a plurality of optical beams, such as EUV beams. A first electron beam is received. The first electron beam is converted into at least a second electron beam and a third electron beam. The second and third second and third electron beams to an undulator. Using the undulator for generating a plurality of output beams using the at least second and third electron beams. The output beams respectively comprises a plurality of optical beam components and a plurality of electron beam component. A first optical beam component of the plurality of optical beam components is provided to a first processing tool.

    Abstract translation: 用于提供诸如EUV波束的多个光束的至少一种方法,装置和系统。 接收第一电子束。 第一电子束被转换成至少第二电子束和第三电子束。 第二和第三个第二和第三个电子束到波动器。 使用波动器来使用至少第二和第三电子束产生多个输出光束。 输出光束分别包括多个光束分量和多个电子束分量。 多个光束分量的第一光束分量被提供给第一处理工具。

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