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公开(公告)号:US09866971B2
公开(公告)日:2018-01-09
申请号:US15305089
申请日:2014-08-26
Applicant: GOERTEK INC.
Inventor: Quanbo Zou , Zhe Wang , Jifang Tao , Guanxun Qiu
CPC classification number: H04R19/02 , B81B7/008 , B81B2201/0257 , B81B2201/032 , B81B2203/0127 , B81B2207/012 , B81C1/00158 , B81C2201/0197 , H04R7/06 , H04R19/013 , H04R31/00 , H04R31/003 , H04R2201/003 , H04R2307/025 , H04R2307/027
Abstract: The present invention provides a method for manufacturing a thermal bimorph diaphragm and a MEMS speaker with thermal bimorphs, wherein the method comprises the steps of: thermally oxidizing a substrate to obtain an insulating layer thereon and providing a metal layer on the insulating layer; providing a sacrificial layer on the metal layer; providing a first thermal bimorph layer on the sacrificial layer; providing a second thermal bimorph layer on the first thermal bimorph layer; providing a metal connecting layer at the positions on the metal layer where the sacrificial layer is not provided; forming corresponding back holes on the substrate and the insulating layer and releasing the sacrificial layer; forming the thermal bimorph diaphragm which is warped with the first thermal bimorph layer and the second thermal bimorph layer after the sacrificial layer is released.