公开(公告)号：US20170307793A1

公开(公告)日：2017-10-26

申请号：US15644991

申请日：2017-07-10

Applicant: Intermolecular Inc. ,  Guardian Industries Corp.

Inventor： Guizhen ZHANG ,  Brent BOYCE ,  Jeremy CHENG ,  Guowen DING ,  Muhammad IMRAN ,  Minh Huu LE ,  Daniel SCHWEIGERT ,  Yongli XU

IPC: G02B5/20 ,  C03C17/36 ,  C23C14/14 ,  C23C14/08 ,  G02F1/09 ,  G02B5/26 ,  E06B9/24 ,  C03C23/00 ,  B29D11/00 ,  C23C14/22

CPC classification number: G02B5/208 ,  B29D11/00865 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C23/007 ,  C03C2217/43 ,  C03C2217/48 ,  C03C2218/154 ,  C23C14/083 ,  C23C14/085 ,  C23C14/14 ,  C23C14/22 ,  E06B9/24 ,  E06B2009/2417 ,  E06B2009/2464 ,  G02B5/26 ,  G02F1/091 ,  G02F2001/094 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.

公开(公告)号：US20130194668A1

公开(公告)日：2013-08-01

申请号：US13713811

申请日：2012-12-13

Applicant: GUARDIAN INDUSTRIES CORP.

Inventor： Liang LIANG ,  Richard BLACKER ,  Mark A. LEWIS ,  Nikhil KALYANKAR ,  Minh Huu LE

IPC: C03C17/22 ,  G02B1/11

CPC classification number: C03C17/22 ,  B82Y20/00 ,  B82Y40/00 ,  C03C1/008 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2217/425 ,  C03C2217/452 ,  C03C2217/465 ,  C03C2217/478 ,  C03C2217/73 ,  C03C2217/732 ,  C03C2217/91 ,  C03C2218/113 ,  C03C2218/116 ,  G02B1/115 ,  G02B2207/107 ,  Y10S977/773

Abstract: Certain examples relate to a method of making an antireflective (AR) coating supported by a glass substrate. The anti-reflection coating may include porous metal oxide(s) and/or silica, and may be produced using a sol-gel process. The pores may be formed and/or tuned in each layer respectively in such a manner that the coating ultimately may comprise a porous matrix, graded with respect to porosity. The gradient in porosity may be achieved by forming first and second layers using one or more of (a) nanoparticles of different shapes and/or sizes, (b) porous nanoparticles having varying pore sizes, and/or (c) compounds/materials of various types, sizes, and shapes that may ultimately be removed from the coating post-deposition (e.g., carbon structures, micelles, etc., removed through combustion, calcination, ozonolysis, solvent-extraction, etc.), leaving spaces where the removed materials were previously located.

Abstract translation: 某些实例涉及制​​备由玻璃基底支撑的抗反射（AR）涂层的方法。 抗反射涂层可以包括多孔金属氧化物和/或二氧化硅，并且可以使用溶胶 - 凝胶法制备。 可以以这样的方式分别在各层中形成和/或调整孔，使得涂层最终可以包括相对于多孔性分级的多孔基质。 孔隙度的梯度可以通过使用一种或多种（a）不同形状和/或尺寸的纳米颗粒形成第一层和第二层来实现，（b）具有不同孔径的多孔纳米颗粒和/或（c） 可能最终从涂层后沉积中除去的各种类型，尺寸和形状（例如，通过燃烧，煅烧，臭氧分解，溶剂萃取等除去的碳结构，胶束等），留下被除去的空间 材料以前位于。