公开(公告)号：US06518577B1

公开(公告)日：2003-02-11

申请号：US09676081

申请日：2000-10-02

申请人： Gang Fang ,  John Houghton ,  Yuri Lawryshyn ,  Joseph Lem ,  Michael Sasges ,  Alex Verdun

发明人： Gang Fang ,  John Houghton ,  Yuri Lawryshyn ,  Joseph Lem ,  Michael Sasges ,  Alex Verdun

IPC分类号： G01N2101

CPC分类号： A61L2/28 ,  A61L2/10 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  G01J1/0252 ,  G01J1/0271 ,  G01J1/04 ,  G01J1/044 ,  G01N21/15 ,  G01N2021/152 ,  G01N2021/157

摘要： There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.

摘要翻译： 公开了一种光辐射传感器系统。 该系统包括传感器装置和清洁装置。 传感器装置检测并响应来自辐射场的辐射，并且包括在表面处于辐射场的第一位置和第二位置之间可相对于辐射场移动的表面，其中至少部分 表面离开辐射场。 清洁装置用于在第二位置从表面的至少一部分去除结垢材料。 清洁装置可以是化学清洁装置，机械清洁装置或组合的化学/机械装置。

公开(公告)号：US06863078B1

公开(公告)日：2005-03-08

申请号：US09744682

申请日：2000-05-26

申请人： Vivian Dall'Armi ,  Gang Fang ,  Yuri Lawryshyn ,  Joseph Lem ,  Douglas Penhale

发明人： Vivian Dall'Armi ,  Gang Fang ,  Yuri Lawryshyn ,  Joseph Lem ,  Douglas Penhale

IPC分类号： B01J19/12 ,  B08B1/00 ,  B08B9/02 ,  C02F1/32 ,  H05B3/00 ,  B08B3/04

CPC分类号： C02F1/325 ,  B01J19/123 ,  B01J2219/0877 ,  B08B1/008 ,  B08B9/023 ,  C02F2201/324 ,  H05B3/0052

摘要： A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.

摘要翻译： 描述了用于流体处理系统中的辐射源组件（35）的清洁设备（10）。 清洁设备包括清洁室（20）和独立于清洁室的第二室（25,30），其限定流体（通常是水）缓冲层，以消除或减轻清洗液体泄漏到被处理流体中的清洁室。 流体处理系统对于我们在使用紫外线辐射来处理水的清洁水应用中特别有用，同时具有当其被污染时原位清洁辐射源的优点。