摘要:
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要:
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要:
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要:
A walking beam furnace is provided for moving a work product through a high temperature (1,600.degree. C.) furnace at high speed in large horizontal increments. A monolithic walking beam mechanism, including an array of parallel beams and support therefor, fabricated entirely from a refractory material such as silicon carbide (SIC), provides a movable, planar hearth surface. A fixed array of longitudinally disposed, spaced-apart hearth members, provides a fixed, planar hearth surface. The beams are narrower than the spacing between the hearth members to permit passage of the ,array of beams in coplanar alignment with the fixed hearth members through the spacing between the hearth members. The beams of the walking beam mechanism and the fixed hearth members alternately support the work product so that the work product is conveyed by the beams in an incremental fashion without sliding the work product along the hearth members during a continuous cycle of raising the monolithic beam support, moving it forward, lowering it, retracting it, and raising it again.
摘要:
A furnace is provided for continuous high-temperature heat processing in which a work product is conveyed through a furnace muffle by rectilinear beam motion. An inner and an outer beam are equipped with interleaved rods which are used to alternately lift the work product and advance it through the muffle. A continuous cycle of sequentially raising and advancing the rods attached to one beam, while lowering and retracting the rods of the other beam causes stepwise movement of the work product through the furnace. At no point in the cycle does the work product, rods, or beams make contact with the muffle, nor do the interleaved rods touch each other. The result is frictionless conveyance of the work product through the muffle which virtually eliminates particle generation.
摘要:
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要:
An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要:
A furnace for thermally processing product includes one or more eductors. The eductor provides for increased circulation of atmosphere within the furnace for heat transfer or outgassing purposes. The eductor may be used to introduce clean gas to a product which outgasses volatiles to enhance the outgassing process by lowering the partial pressure of the volatile across the product as it is being heated. The eductor is also used to enhance heating or cooling of a product. Additionally, the eductor may be used to reduce or eliminate air stagnation areas within the furnace. The eductor may be located entirely within the furnace to recirculate the atmosphere of the furnace. Alternatively, the eductor may be located outside the furnace housing such that the eductor entrains gas from ports attached to the furnace and then reintroduces the gas into the furnace after the gas is cleaned, heated or cooled.
摘要:
A furnace includes a high temperature heating source located within the cavity of the furnace which incinerates undesired effluents produced during the normal thermal processing of material. The heating source comprises one or more hot wires disposed within apertured tubes, which are at a temperature above the ignition point of the undesired effluents. As the effluents pass into the tube through the apertures, they are incinerated, thereby producing an exhaust that is generally pollution free. Additionally, the heat used during the incinerating of the undesired effluents fully provides the heating requirements of the furnace for the thermal processing of material.
摘要:
A support assembly for supporting a glass panel during thermal processing. In one embodiment, a support assembly includes a base member, and a mechanism secured to the base member. The mechanism includes a support plate adapted for contact with a panel, wherein the mechanism is operative to distribute the weight of the panel and support plate about a bottom surface of the support plate. In a further embodiment a support assembly includes a base assembly and a leveling assembly having a plurality of plates defining a support surface. An alternative embodiment of a support assembly is adapted for supporting panels in a vertical position and includes a base assembly and a levelling assembly.