公开(公告)号：US20170345628A1

公开(公告)日：2017-11-30

申请号：US15540325

申请日：2015-10-26

Applicant: General Plasma Inc.

Inventor： Phong NGO ,  John E. Madocks

IPC: H01J37/34

CPC classification number: H01J37/3423 ,  H01J37/3405 ,  H01J37/3438 ,  H01J37/345 ,  H01J37/3452

Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.

公开(公告)号：US20210333438A1

公开(公告)日：2021-10-28

申请号：US16614165

申请日：2018-05-22

Applicant: General Plasma Inc.

Inventor： Phong NGO

IPC: G02B1/118 ,  G02B5/28

Abstract: Multilayer antireflective articles are disclosed. In embodiments, the multilayer antireflective articles include a combination of a moth-eye layer and a multi-layer antireflective stack. The articles can exhibit desirable optical properties for use in various applications, including screen overlays. Methods of forming such articles are also disclosed.