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公开(公告)号：US07334871B2
公开(公告)日：2008-02-26
申请号：US10810270
申请日：2004-03-26
摘要： The described embodiments relate to fluid-ejection devices and methods of forming same. One exemplary embodiment includes a plurality of fluid drop generators and associated electrically conductive paths, and at least one electron beam generation assembly configured to selectively direct at least one electron beam at individual electrically conductive paths sufficiently to cause fluid to be ejected from an associated fluid drop generator.
摘要翻译： 所描述的实施例涉及流体喷射装置及其形成方法。 一个示例性实施例包括多个流体液滴发生器和相关联的导电路径，以及至少一个电子束产生组件，被配置为在各个导电路径下选择性地引导至少一个电子束，以使流体从相关联的液滴 发电机。
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2.发明授权Discharge of MEM devices having charge induced via focused beam to enter different states 失效具有通过聚焦光束诱导的电荷进入不同状态的MEM器件的放电公开(公告)号：US07535619B2
公开(公告)日：2009-05-19
申请号：US11831797
申请日：2007-07-31
CPC分类号： G02B26/0833 , G02B26/0841 , H04N9/312
摘要： An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.
摘要翻译： 一种装置包括微机电（MEM）装置，电荷源和放电机构。 每个MEM器件基于其上引入的电荷而具有不同的状态。 电荷源是在其上诱导电荷，使得MEM器件各自进入其不同状态之一。 用于MEM器件的放电机构是在其上放电。 放电机构包括用于每个MEM器件的电阻器和紫外线（UV）光源之一。 电阻器将其MEM器件上的电荷放电到地。 UV光源将光子发射到MEM器件上，使得光子通过光电效应对MEM器件上的电荷进行放电。
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3.发明授权Discharge of MEM devices having charge induced via focused beam to enter different states 失效具有通过聚焦光束诱导的电荷进入不同状态的MEM器件的放电公开(公告)号：US07268933B2
公开(公告)日：2007-09-11
申请号：US11115790
申请日：2005-04-27
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G09G3/002 , G09G3/346 , G09G2320/043 , G09G2360/141 , H04N5/7416
摘要： An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.
摘要翻译： 一种装置包括微机电（MEM）装置，电荷源和放电机构。 每个MEM器件基于其上引入的电荷而具有不同的状态。 电荷源是在其上诱导电荷，使得MEM器件各自进入其不同状态之一。 用于MEM器件的放电机构是在其上放电。 放电机构包括用于每个MEM器件的电阻器和紫外线（UV）光源之一。 电阻器将其MEM器件上的电荷放电到地。 UV光源将光子发射到MEM器件上，使得光子通过光电效应对MEM器件上的电荷进行放电。
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公开(公告)号：US20090046130A1
公开(公告)日：2009-02-19
申请号：US11839954
申请日：2007-08-16
申请人： George Z. Radominski , Chris Aschoff , Alexander Govyadinov , Silam J. Choy , Martha A. Truninger
发明人： George Z. Radominski , Chris Aschoff , Alexander Govyadinov , Silam J. Choy , Martha A. Truninger
CPC分类号： B41J2/14314 , B41J2/16 , B41J2/1623 , B41J2/1626 , B41J2/1631 , B41J2/1635 , Y10T29/49401
摘要： In one embodiment a method of making an electrostatic actuator includes: forming a first conductor over a first substrate to form a first structure; forming a flexible second conductor over a second substrate to form a second structure; forming an etch stop over the first conductor as part of the first structure or over the second conductor as part of the second structure; forming a spacer on the etch stop, the spacer selectively etchable with respect to the etch stop; etching the spacer through to the etch stop at a location of a gap between the first conductor and the second conductor; and bonding the first structure and the second structure together such that the first conductor is located opposite the second conductor across the gap.
摘要翻译： 在一个实施例中，制造静电致动器的方法包括：在第一基板上形成第一导体以形成第一结构; 在第二基板上形成柔性第二导体以形成第二结构; 在所述第一导体上形成蚀刻停止，作为所述第一结构的一部分，或在所述第二导体上形成作为所述第二结构的一部分的蚀刻停止; 在所述蚀刻停止件上形成间隔物，所述间隔物可相对于所述蚀刻停止部选择性地蚀刻; 在所述第一导体和所述第二导体之间的间隙的位置处将所述间隔物蚀刻到所述蚀刻停止件; 以及将所述第一结构和所述第二结构接合在一起，使得所述第一导体跨过所述间隙与所述第二导体相对。
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公开(公告)号：US07506985B2
公开(公告)日：2009-03-24
申请号：US11259202
申请日：2005-10-26
CPC分类号： G03B21/2013 , G03B21/16 , G03B21/2033 , G03B27/54 , H04N5/74 , H04N9/315 , Y10S362/80
摘要： A light source comprises a plurality of light emitting diodes arranged around the perimeter of a reflective optical element, wherein each of the light emitting diodes selectively generates a light beam directed to the reflective optical element. The reflective optical element generates a light path by collimating and reflecting the selectively generated light beams from each of the light emitting diodes.
摘要翻译： 光源包括围绕反射光学元件的周边布置的多个发光二极管，其中每个发光二极管选择性地产生指向反射光学元件的光束。 反射光学元件通过对来自每个发光二极管的选择性地产生的光束进行准直和反射来产生光路。
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公开(公告)号：US07677706B2
公开(公告)日：2010-03-16
申请号：US11839954
申请日：2007-08-16
申请人： George Z. Radominski , Chris Aschoff , Alexander Govyadinov , Silam J. Choy , Martha A. Truninger
发明人： George Z. Radominski , Chris Aschoff , Alexander Govyadinov , Silam J. Choy , Martha A. Truninger
IPC分类号： B41J2/045
CPC分类号： B41J2/14314 , B41J2/16 , B41J2/1623 , B41J2/1626 , B41J2/1631 , B41J2/1635 , Y10T29/49401
摘要： In one embodiment a method of making an electrostatic actuator includes: forming a first conductor over a first substrate to form a first structure; forming a flexible second conductor over a second substrate to form a second structure; forming an etch stop over the first conductor as part of the first structure or over the second conductor as part of the second structure; forming a spacer on the etch stop, the spacer selectively etchable with respect to the etch stop; etching the spacer through to the etch stop at a location of a gap between the first conductor and the second conductor; and bonding the first structure and the second structure together such that the first conductor is located opposite the second conductor across the gap.
摘要翻译： 在一个实施例中，制造静电致动器的方法包括：在第一基板上形成第一导体以形成第一结构; 在第二基板上形成柔性第二导体以形成第二结构; 在所述第一导体上形成蚀刻停止，作为所述第一结构的一部分，或在所述第二导体上形成作为所述第二结构的一部分的蚀刻停止; 在所述蚀刻停止件上形成间隔物，所述间隔物可相对于所述蚀刻停止部选择性地蚀刻; 在所述第一导体和所述第二导体之间的间隙的位置处将所述间隔物蚀刻到所述蚀刻停止件; 以及将所述第一结构和所述第二结构接合在一起，使得所述第一导体跨过所述间隙与所述第二导体相对。
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