公开(公告)号：US10716198B2

公开(公告)日：2020-07-14

申请号：US16452906

申请日：2019-06-26

申请人： Gigaphoton Inc.

发明人： Akihiro Takayama

IPC分类号： H05G2/00 ,  G03F7/20 ,  G21K5/10 ,  H01S3/02

摘要： An extreme ultraviolet light generation apparatus includes: a chamber; an optical unit; a chamber reference member including a housing space in which the optical unit is housed; a height positioning mechanism configured to position, at a predetermined installation position in the housing space, the optical unit to a predetermined installation height while contacting a first part of the optical unit; and a movement mechanism configured to linearly move the optical unit in the horizontal direction in the housing space while keeping the optical unit at a guide height, and including a guide member and a retraction part, wherein the guide height of the optical unit while being guided to move toward the installation position by the guide surface is substantially equal to the installation height.

公开(公告)号：US10582602B2

公开(公告)日：2020-03-03

申请号：US16536055

申请日：2019-08-08

申请人： Gigaphoton Inc.

发明人： Atsushi Ueda ,  Akihiro Takayama

IPC分类号： H05G2/00 ,  G03F7/20

摘要： An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.

公开(公告)号：US10959317B1

公开(公告)日：2021-03-23

申请号：US16938895

申请日：2020-07-24

申请人： Gigaphoton Inc.

发明人： Akihiro Takayama

IPC分类号： H05G2/00 ,  G03F7/20

摘要： An EUV light generating apparatus includes: a chamber device including an inner wall surrounding a space, and a plasma generating region in the space in which plasma is generated from a droplet irradiated with a laser beam; a heat shield including a through-hole and a channel portion, and disposed between the inner wall and the plasma generating region; a gas supply device that supplies gas; a gas introducing cylinder that is provided in the space on a side opposite to the plasma generating region, extends toward the through-hole, and introduces the gas supplied from the gas supply device through the through-hole toward the plasma generating region over the heat shield; and an optical unit optically coupled to the space through an internal space of the gas introducing cylinder and the through-hole. An entire front end surface of the gas introducing cylinder faces the heat shield.

公开(公告)号：US10374381B2

公开(公告)日：2019-08-06

申请号：US15590238

申请日：2017-05-09

申请人： Gigaphoton Inc.

发明人： Toru Suzuki ,  Takashi Suganuma ,  Akihiro Takayama ,  Yoshiaki Kurosawa

IPC分类号： H01S3/10 ,  H05G2/00 ,  H01L21/30 ,  H01S3/00 ,  H01S5/00

摘要： A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.