公开(公告)号：US20240427094A1

公开(公告)日：2024-12-26

申请号：US18212754

申请日：2023-06-22

Applicant: GlobalFoundries U.S. Inc.

Inventor： Keith Donegan ,  Takako Hirokawa ,  Yusheng Bian ,  Thomas Houghton ,  Kevin Dezfulian ,  Carrie Yurkon

IPC: G02B6/42 ,  G06T7/00

Abstract: Structures including a calibration marker adjacent to a photonic structure and methods of forming such structures. The structure comprises a semiconductor substrate, a photonic structure, and a back-end-of-line stack over the semiconductor substrate. The back-end-of-line stack includes a plurality of fill features, an exclusion area surrounded by the plurality of fill features, and a calibration marker in the exclusion area. The calibration marker is disposed adjacent to the photonic structure, and the calibration marker includes a feature having a predetermined dimension.