Abstract:
A spectral analyzer and direction indicator system (10) is disclosed and includes first and second optical channels (20,30) for providing detected optical information indicative of incidence direction and spectral content of incident radiation. The first optical channel includes a reflector element (11) having a non-ruled section (11a) and a spectrally dispersing ruled section (11b); an analytical optical system (13); and a detector array (15). In the reflector element of the first optical channel the non-ruled section is tilted relative to the ruled section. The second optical channel includes a non-dispersing reflector element (17), an analytical optical system (19), and a detector array (21).
Abstract:
A contour plotter for testing the response of an infrared detector comprig a small, cathode-ray tube with a hidden electron gun for generating a flying-hot-spot raster, a refracting, optical lens for focussing a reduced image of this raster on the detector under test, an oscilloscope, a two-dimensional sweep generator for sweeping the oscilloscope and the small, cathode ray tube in synchronism, and an electronic amplifier for applying the output of the detector to the Z-axis of the oscilloscope so that the intensity of the oscilloscope scanning beam is varied in accordance with the detector output response.In one embodiment, the small, cathode-ray tube uses an infrared phosphor screen to produce a small source of radiation. In a second embodiment, the cathode-ray tube uses a thin membrane screen formed by a thin film dielectric substrate with a refractory metal film deposited on it for producing a flying hot spot.
Abstract:
A spectral analyzer and direction indicator system (10) is disclosed and includes optical channels (20,30,40) for providing detected optical information indicative of incidence direction and spectral content of incident radiation. Each optical channel includes a reflector element (11,17,23) having a non-ruled section (11a,17a,23a) and a spectrally dispersing ruled section (11b,17b,23b); an analytical optical system (13,19,25); and a detector array (15,21,27). For each reflector element the non-ruled section is tilted in one or two directions relative to the ruled section. The disclosed spectral analyzer and direction indicator system is advantageously utilized as an aircraft based sensor in an aircraft landing system having ground lasers (29L,29R,33L,33R,37L,37R) directed into the landing approach path.
Abstract:
A spectral analyzer and direction indicator is disclosed and is responsive to collimated or essentially collimated incident radiation. The spectral analyzer and direction indicator includes optical apparatus (13, 15, 113) for providing optical information including diffracted optical information. A detector structure (21, 23, 117) is responsive to the optical information to provide detection output information indicative of incidence direction and spectral content collimated or essentially collimated incident radiation. A processor (20, 120) determines whether the diffraction information includes second order diffraction.
Abstract:
Disclosed are novel opto-isolator devices and processes for fabricating same wherein suitable semiconductive substrates, such as galium arsenide wafers, are treated with conductivity type determining impurities in such a manner as to form radiation emitters, radiation detectors and interconnecting waveguides therein. These operative regions which form a monolithic opto-isolator have the necessary electro-optical characteristics for generating and coupling radiation from the emitter and through the waveguide coupler to the detector; and all of these regions may be integrally fabricated in a monolithic batch fabrication process. Such process may use, for example, particle implantation and masking steps, thereby ensuring high yield and low cost device fabrication.
Abstract:
A spectral analyzer and direction indicator system (10) is disclosed and includes optical channels (20,30,40) for providing detected optical information indicative of incidence direction and spectral content of incident radiation. Each optical channel includes a reflector element (11,17,23) having a non-ruled section (11a, 17a, 23a) and a spectrally dispersing ruled section (11b, 17b, 23b); an analytical optical system (13,19,25); and a detector array (15,21,27). For each reflector element the non-ruled section is tilted in one or two directions relative to the ruled section. The disclosed spectral analyzer and direction indicator system is advantageously utilized as an aircraft based sensor in an aircraft landing system having ground based lasers (29L, 29R, 33L, 33R, 37L, 37R) directed into the landing approach path.
Abstract:
A spectral analyzer and direction indicator and direction indicator (10,20) is disclosed and includes reflection gratings (13,15,25,27,37,39), associated optical systems (17,19,29,33,41,45) and associated detectors (21,23,31,35,43,47,30). The reflection gratings (13,15,25,27,37,39) are arranged to provided angles of diffraction which are utilized to determine spectral content and incidence direction of collimated or essentially collimated incident radiation.
Abstract:
Disclosed is an improved optical waveguide and modulator and an ion implantation process for fabricating same. The process includes the step of implanting high energy protons in a suitable semiconductive substrate material, such as gallium arsenide, to form a semi-insulating wave guiding layer therein for efficiently sustaining light propagation. The relatively large difference between the refractive indices of the high resistivity proton implanted layer and of the underlying low resistivity substrate result in highly efficient coupling and modulation of light passing through the proton implanted layer. The letter is partly the result of the relatively high resistivity attainable by proton implantation and partly the result of the sharp profile of ion dosage versus proton implantation distance into the substrate.
Abstract:
Disclosed is an ion implantation process control system wherein the ion dosage in semiconductor wafers is continuously controlled. This control is achieved by controllably and incrementally integrating the ion beam current to provide a control signal, and then utilizing this control signal to provide controlled relative movement between the ion beam and the surface area upon which it fails.