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45 条记录 (耗时 0.032 秒)

    Flat panel display manufacturing apparatus
    1.
    发明授权
    Flat panel display manufacturing apparatus 有权
    平板显示器制造装置

    公开(公告)号：US08273211B2

    公开(公告)日：2012-09-25

    申请号：US12246563

    申请日：2008-10-07

    申请人： Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

    发明人： Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

    IPC分类号： H01L21/3065

    CPC分类号： H01J37/3244

    摘要： Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

    摘要翻译： 这里公开了使用其中产生的等离子体进行预定处理的平板显示器制造装置。 在这种平板显示器制造装置中，处理气体以均匀扩散的状态供应到室中，以在室的对称内部空间内产生均匀的等离子体。 因此，平板显示器制造装置可以适当地控制等离子体的流量，从而能够对大规模基板进行均匀的处理。 在平板显示器制造装置中，其基板基座设置有垂直和水平屏蔽构件的组合，从而完全防止等离子体的侵蚀，从而延长使用寿命。

    Transfer chamber for flat display device manufacturing apparatus
    2.
    发明授权
    Transfer chamber for flat display device manufacturing apparatus 失效
    平板显示装置制造装置用转印室

    公开(公告)号：US07665947B2

    公开(公告)日：2010-02-23

    申请号：US12129010

    申请日：2008-05-29

    申请人： Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

    发明人： Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

    IPC分类号： H01L21/677

    CPC分类号： H01L21/68707 ,  H01L21/67742 ,  Y10S414/139 ,  Y10S414/141

    摘要： A transfer chamber for a flat display device manufacturing apparatus is provided. The transfer chamber may provide a combination of the functions of a transfer and a load-lock chamber. A robot may be provided aside from a center of the transfer chamber, a buffer may be provided and be driven without interference with the robot, and an aligner may be provided to adjust a position of a substrate mounted on the buffer. A sealing member may be provided to seal a hole formed at a predetermined portion of the transfer chamber.

    摘要翻译： 提供了一种用于平板显示装置制造装置的传送室。 传送室可以提供转印和装载锁定室的功能的组合。 可以从传送室的中心设置机器人，可以提供缓冲器并且不受机器人的干扰而被驱动，并且可以设置对准器以调整安装在缓冲器上的基板的位置。 可以设置密封构件以密封形成在传送室的预定部分处的孔。

    TRANSFER CHAMBER FOR FLAT DISPLAY DEVICE MANUFACTURING APPARATUS
    4.
    发明申请
    TRANSFER CHAMBER FOR FLAT DISPLAY DEVICE MANUFACTURING APPARATUS 失效
    平板显示设备制造设备的传送室

    公开(公告)号：US20080292431A1

    公开(公告)日：2008-11-27

    申请号：US12129010

    申请日：2008-05-29

    申请人： Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

    发明人： Gwang Ho Hur ,  Jun Young Choi ,  Sang Baek Lee ,  Cheol Won Lee

    IPC分类号： B65G1/00

    CPC分类号： H01L21/68707 ,  H01L21/67742 ,  Y10S414/139 ,  Y10S414/141

    摘要： The present invention relates to a transfer chamber for a flat display device manufacturing apparatus, and more particularly, to a transfer chamber for a flat display device manufacturing apparatus, having a combination of functions of transfer and load-lock chambers, in which a robot is provided aside from a center of the transfer chamber, a buffer is provided to be driven without interference of the robot, and a aligner is provided to adjust a position of a substrate mounted on the buffer. In order to achieve the aforementioned objects, there is provided a transfer chamber for a flat display device manufacturing apparatus, wherein a robot is provided aside from a center of the transfer chamber. In addition, in order to drive the robot, a sealing member is provided to seal a hole formed at a predetermined portion of the transfer chamber, and an aligner for adjusting the substrate in the transfer chamber and a buffer where the substrate is mounted on are provided.

    摘要翻译： 本发明涉及一种用于平板显示装置制造装置的传送室，更具体地说，涉及一种平面显示装置制造装置的传送室，其具有传送和装载锁定室的功能的组合，其中机器人是 除了传送室的中心之外，提供缓冲器以在机器人的干扰的情况下被驱动，并且提供对准器以调整安装在缓冲器上的基板的位置。 为了实现上述目的，提供了一种用于平板显示装置制造装置的传送室，其中机器人设置在传送室的中心的旁边。 此外，为了驱动机器人，设置密封构件以密封形成在传送室的预定部分处的孔，并且用于调节传送室中的基板的对准器和安装有基板的缓冲器 提供。

    Plasma processing apparatus
    5.
    发明授权
    Plasma processing apparatus 失效
    等离子体处理装置

    公开(公告)号：US07537673B2

    公开(公告)日：2009-05-26

    申请号：US11219956

    申请日：2005-09-06

    申请人： Young Jong Lee ,  Jun Young Choi ,  Hyun Hwan Ahn ,  Chan-Ho Kang ,  Hyun-Woo Baek ,  Young-Joo Hwang

    发明人： Young Jong Lee ,  Jun Young Choi ,  Hyun Hwan Ahn ,  Chan-Ho Kang ,  Hyun-Woo Baek ,  Young-Joo Hwang

    IPC分类号： H01L21/3065 ,  C23C16/00 ,  C23C16/458 ,  C23C16/50

    CPC分类号： C23C16/4585

    摘要： Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.

    摘要翻译： 本文公开了一种等离子体处理装置，其在真空室内产生等离子体以使用等离子体处理半导体衬底。 该装置包括基板安装台，外提升杆和挡板。 外提升杆包括驱动轴和垂直于驱动轴的上端联接的基板支撑构件。 挡板包括耦合到驱动轴的上端的挡板和耦合到挡板的下表面的屏蔽部分。 衬底支撑构件是可折叠衬底支撑构件。 挡板和基板支撑构件通过驱动轴同时上下驱动。 结果，可以在等离子体处理装置的操作期间保护基板支撑构件免受等离子体的影响，并且防止挡板和外部提升杆之间的干扰。