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公开(公告)号：US20050008950A1
公开(公告)日：2005-01-13
申请号：US10912030
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
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公开(公告)号：US20050008951A1
公开(公告)日：2005-01-13
申请号：US10912031
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
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公开(公告)号：US20050008953A1
公开(公告)日：2005-01-13
申请号：US10912510
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
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公开(公告)号：US20050008952A1
公开(公告)日：2005-01-13
申请号：US10912256
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
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公开(公告)号：US20050008949A1
公开(公告)日：2005-01-13
申请号：US10912029
申请日：2004-08-04
申请人： H. Dulman , William Stanton , John Futrell
发明人： H. Dulman , William Stanton , John Futrell
CPC分类号： G03F1/36
摘要： The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
摘要翻译： 本发明包括形成图案化的掩模版的方法。 在光学邻近校正之前，可以将设计特征引入到掩模版的布局中，然后在将图案胶带到掩模版之前去除。 可以替代地或另外地，在光学邻近校正之后引入设计特征，而不对称地相对于掩模版图案的一个或多个部分。 引入的特征随后可以作为形成图案化的掩模版的一部分而被粘贴在掩模版上。
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公开(公告)号：US20060235663A1
公开(公告)日：2006-10-19
申请号：US11423075
申请日：2006-06-08
CPC分类号： G03F1/36 , Y10S715/964
摘要： Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
摘要翻译： 提供的装置和方法包括诸如识别作为光刻干涉的结果而出现的频繁不想要的附加特征的尺寸，形状和位置的能力的优点。 通过使用减少处理时间的模拟方法或求解方程组来获得附加特征信息。 这允许用户在打印功能之前，以及在制作掩模版之前，快速查找有关附加功能打印的信息。
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公开(公告)号：US20060234140A1
公开(公告)日：2006-10-19
申请号：US11423082
申请日：2006-06-08
CPC分类号： G03F1/36 , Y10S715/964
摘要： Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
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