公开(公告)号：US10546715B2

公开(公告)日：2020-01-28

申请号：US15761294

申请日：2015-09-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shahedul Hoque ,  Hajime Kawano ,  Yoshinori Momonoi ,  Hideki Itai ,  Minoru Yamazaki ,  Hiroshi Nishihama

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

公开(公告)号：US08872106B2

公开(公告)日：2014-10-28

申请号：US13789346

申请日：2013-03-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroshi Nishihama ,  Tatsuya Maeda ,  Mitsuji Ikeda ,  Susumu Koyama

IPC: H01J37/00 ,  H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

Abstract translation: 本发明的目的是提供一种在同时减少落在待测图案上的光束的剂量的同时执行高精度凹凸确定（例如，区分线段和空间）的图案测量装置。 为了实现该目的，本发明提出了一种图形测量装置，其通过相对于与测量对象区域不同的另一区域扫描倾斜的豆来指定测量对象区域中的图案，然后基于图案指定结果进行测量。 通过这样的布置，可以在降低射击测量对象区域的光束的剂量的情况下进行测量而不会出现错误的图案指定的风险。

公开(公告)号：US20140021349A1

公开(公告)日：2014-01-23

申请号：US13789323

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Nishihama ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

Abstract translation: 本发明的目的是提供一种在同时减少落在待测图案上的光束的剂量的同时执行高精度凹凸确定（例如，区分线段和空间）的图案测量装置。 为了实现该目的，本发明提出了一种图形测量装置，其通过相对于与测量对象区域不同的另一区域扫描倾斜的豆来指定测量对象区域中的图案，然后基于图案指定结果进行测量。 通过这样的布置，可以在降低射击测量对象区域的光束的剂量的情况下进行测量而不会出现错误的图案指定的风险。

公开(公告)号：US08618517B1

公开(公告)日：2013-12-31

申请号：US13789323

申请日：2013-03-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroshi Nishihama ,  Tatsuya Maeda ,  Mitsuji Ikeda ,  Susumu Koyama

IPC: H01J37/28 ,  H01J37/256 ,  G01N23/00

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.