公开(公告)号：US20200256804A1

公开(公告)日：2020-08-13

申请号：US16616069

申请日：2018-02-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshifumi HONDA ,  Shunichi MATSUMOTO ,  Masami MAKUUCHI ,  Yuta URANO ,  Keiko OKA

IPC: G01N21/88 ,  G01N21/956 ,  G01N21/47

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.