公开(公告)号：US20200271594A1

公开(公告)日：2020-08-27

申请号：US16066208

申请日：2016-01-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Shunichi MATSUMOTO

IPC: G01N21/95

Abstract: An inspection device has an illuminating optical system for forming an illuminated area on a sample, a converging optical system for converging the light from the sample, and a detector for detecting the light converged by the converging optical system. The converging optical system includes an image forming element that includes a lens group that has divided apertures and is configured so as to form a plurality of images. The detector detects a signal for the images formed by the image forming element. The detector has a plurality of partitions disposed in a matrix, the partitions include first and second pixels, and the images are projected onto the partitions.

公开(公告)号：US20200256804A1

公开(公告)日：2020-08-13

申请号：US16616069

申请日：2018-02-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshifumi HONDA ,  Shunichi MATSUMOTO ,  Masami MAKUUCHI ,  Yuta URANO ,  Keiko OKA

IPC: G01N21/88 ,  G01N21/956 ,  G01N21/47

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

公开(公告)号：US20160161422A1

公开(公告)日：2016-06-09

申请号：US15042598

申请日：2016-02-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shunichi MATSUMOTO ,  Atsushi TANIGUCHI ,  Toshifumi HONDA ,  Yukihiro SHIBATA ,  Yuta URANO

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/126 ,  G01N2201/127 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.

Abstract translation: 一种缺陷检查方法和装置，用于将安装在台上的表面图案样品上的线性区域照射到具有来自倾斜方向的样品的照明光，并在多个方向上检测从所述多个方向散射的光的图像 用照射光照射的样品，然后处理通过检测散射光的图像获得的信号，从而检测样品上存在的缺陷; 其特征在于，通过椭圆形透镜，其光轴的仰角彼此不同，在垂直于由所述平面形成的法线形成的平面的一个平面内，通过椭圆形透镜来检测多个方向上的散射光图像的步骤 用于安装样品的台面和用照射光照射的线性区域的纵向方向。

公开(公告)号：US20160139059A1

公开(公告)日：2016-05-19

申请号：US14895618

申请日：2014-05-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shunichi MATSUMOTO ,  Akira HAMAMATSU ,  Takahiro JINGU

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/0636

Abstract: An inspection device is required to detect a minute defect, that is, to have high sensitivity as semiconductor devices become finer. There are some approaches for improving the sensitivity. One is to shorten the wavelength of illuminating light radiated onto a sample. This is because, assuming that the wavelength of the illuminating light is λ, I∝λ−4 is established between the magnitude of scattered light is I and λ. Another approach is to use illuminating light including multiple wavelengths. An approach for taking in more scattered light generated from the sample is also possible. However, an optical system suitable for these approaches has not been sufficiently found in conventional techniques. One feature of the present invention is to detect a defect by using a Wolter optical system including a Wolter mirror.

Abstract translation: 需要检查装置来检测微小缺陷，即，随着半导体器件变得更细，具有高灵敏度。 有一些提高灵敏度的方法。 一个是缩短辐射到样品上的照明光的波长。 这是因为，假设照明光的波长为λ，则在散射光的大小为I和λ之间建立Iαλ-4。 另一种方法是使用包括多个波长的照明光。 采用从样品产生的更多散射光的方法也是可能的。 然而，适用于这些方法的光学系统在常规技术中尚未充分发现。 本发明的一个特征是通过使用包括Wolter反射镜的Wolter光学系统来检测缺陷。

公开(公告)号：US20150116712A1

公开(公告)日：2015-04-30

申请号：US14587271

申请日：2014-12-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Takehiro TACHIZAKI ,  Masahiro WATANABE ,  Shunichi MATSUMOTO

IPC: G01N21/95 ,  G01N21/47 ,  G01N21/21

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

Abstract translation: 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且插入空间滤光器和分布偏振元件 在使用该光学显微镜进行暗视场观察时在瞳孔平面上。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且在制造时将分配滤波器插入瞳孔平面 使用该光学显微镜进行暗场观测。

公开(公告)号：US20170146463A1

公开(公告)日：2017-05-25

申请号：US15127686

申请日：2015-01-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi HONDA ,  Yuta URANO ,  Shunichi MATSUMOTO ,  Taketo UENO ,  Yuko OTANI

IPC: G01N21/956 ,  G01N21/47 ,  G01N21/95

CPC classification number: G01N21/956 ,  G01N21/4738 ,  G01N21/9501 ,  G01N2021/4792 ,  G01N2021/8848 ,  G01N2201/121

Abstract: A defect inspection method includes irradiating a sample with laser, condensing and detecting scattered light beams, processing signals that detectors have detected and extracting a defect on a sample surface, and outputting information on the extracted defect. Detection of the scattered light beams is performed by condensing the scattered light beams, adjusting polarization directions of the condensed scattered light beams, mutually separating the light beams depending on the polarization direction, and detecting the light beams by a plurality of detectors. Extraction of the defect is performed by processing output signals from the detectors by multiplying each detection signal by a gain, discriminating between a noise and the defect, and detecting the defect.