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公开(公告)号:US20140319370A1
公开(公告)日:2014-10-30
申请号:US14328754
申请日:2014-07-11
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor: Hiroyasu SHICHI , Shinichi MATSUBARA , Norihide SAHO , Masahiro YAMAOKA , Noriaki ARAI
CPC classification number: H01J27/26 , H01J27/022 , H01J37/023 , H01J37/067 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/061 , H01J2237/0807 , H01J2237/2803
Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
Abstract translation: 根据本发明的离子束装置包括气体离子源(1),其包括由发射极基座(64)支撑的发射极尖端(21),包括引出电极(24)的电离室(15) 构造成围绕发射器尖端(21),以及气体供应管(25)。 引出电极(24)的中心轴线与离子照射光系统的中心轴线(14A)重叠或平行,通过发射极尖端(21)和发射极基座 (64)相对于所述电离室(15)的中心轴线是可倾斜的。 因此,提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。
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公开(公告)号:US20170076902A1
公开(公告)日:2017-03-16
申请号:US15361642
申请日:2016-11-28
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor: Hiroyasu SHICHI , Shinichi MATSUBARA , Norihide SAHO , Masahiro YAMAOKA , Noriaki ARAI
IPC: H01J27/26
CPC classification number: H01J27/26 , H01J27/022 , H01J37/023 , H01J37/067 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/061 , H01J2237/0807 , H01J2237/2803
Abstract: An ion beam device according to the present invention includes a gas field ion source including an emitter tip supported by an emitter base mount, a ionization chamber including an extraction electrode and being configured to surround the emitter tip, and a gas supply tube. A center axis line of the extraction electrode overlaps or is parallel to a center axis line of the ion irradiation light system, and a center axis line passing the emitter tip and the emitter base mount is inclinable with respect to a center axis line of the ionization chamber. Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
Abstract translation: 根据本发明的离子束装置包括气体离子源,其包括由发射极基座支撑的发射极尖端,包括引出电极并被配置为围绕发射极尖端的电离室和气体供应管。 引出电极的中心轴线与离子照射光系统的中心轴线重叠或平行,并且通过发射极尖端和发射极基座的中心轴线相对于电离的中心轴线是可倾斜的 房间。 因此,提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。
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