公开(公告)号：US11810746B2

公开(公告)日：2023-11-07

申请号：US17473096

申请日：2021-09-13

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Alexander S. Perel ,  Jay T. Scheuer ,  Bon-Woong Koo ,  Robert C. Lindberg ,  Peter F. Kurunczi ,  Graham Wright

IPC: H01J27/02 ,  H01J37/08

CPC classification number: H01J27/024 ,  H01J37/08 ,  H01J2237/0455 ,  H01J2237/061 ,  H01J2237/327

Abstract: An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.

公开(公告)号：US11735432B2

公开(公告)日：2023-08-22

申请号：US17225272

申请日：2021-04-08

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Kiet A. Chau ,  Thy Yam ,  Michael J. Walsh

IPC: H01L21/311 ,  C03C15/02 ,  H01L21/306 ,  H01L21/3213 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/3105 ,  C03C15/00 ,  H01L21/265 ,  H01L21/308

CPC classification number: H01L21/32134 ,  C03C15/00 ,  C03C15/025 ,  H01L21/0234 ,  H01L21/02115 ,  H01L21/02167 ,  H01L21/02227 ,  H01L21/02238 ,  H01L21/02252 ,  H01L21/02274 ,  H01L21/02326 ,  H01L21/26566 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/30604 ,  H01L21/3105 ,  H01L21/31105 ,  H01L21/31111 ,  H01L21/31116 ,  H01J2237/061 ,  H01J2237/0812

Abstract: A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.

公开(公告)号：US20180218874A1

公开(公告)日：2018-08-02

申请号：US15576687

申请日：2016-01-06

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Bok Lae CHO ,  In Yong PARK

IPC: H01J37/065 ,  H01J37/26

CPC classification number: H01J37/065 ,  H01J37/06 ,  H01J37/26 ,  H01J2237/061 ,  H01J2237/06341

Abstract: The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

公开(公告)号：US20180211807A1

公开(公告)日：2018-07-26

申请号：US15874798

申请日：2018-01-18

Applicant: FEI Company

Inventor： Gregory A. Schwind ,  Aurelien Philippe Jean Maclou Botman ,  Sean Kellogg ,  Leon van Kouwen ,  Luigi Mele

IPC: H01J27/20 ,  H01J37/08 ,  H01J37/26

CPC classification number: H01J27/20 ,  H01J27/205 ,  H01J37/08 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/082

Abstract: A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

公开(公告)号：US09607805B2

公开(公告)日：2017-03-28

申请号：US15150858

申请日：2016-05-10

Applicant: Hermes Microvision Inc.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/04 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US09601298B2

公开(公告)日：2017-03-21

申请号：US14833447

申请日：2015-08-24

Applicant: NuFlare Technology, Inc.

Inventor： Nobuo Miyamoto

IPC: H01J29/02 ,  H01J29/48 ,  H01J3/02 ,  H01J3/38 ,  H01J29/92 ,  H01J29/96 ,  H01J37/065

CPC classification number: H01J29/025 ,  H01J3/027 ,  H01J3/38 ,  H01J29/02 ,  H01J29/485 ,  H01J29/92 ,  H01J29/96 ,  H01J37/065 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/061 ,  H01J2237/31776

Abstract: An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.

公开(公告)号：US09520204B2

公开(公告)日：2016-12-13

申请号：US14140893

申请日：2013-12-26

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang

IPC: H01J23/00 ,  G21K1/14 ,  H05H5/06 ,  H01J37/317 ,  H01L21/265 ,  H05H7/08

CPC classification number: G21K1/14 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/0048 ,  H01J2237/047 ,  H01J2237/061 ,  H01J2237/082 ,  H01L21/265 ,  H05H5/063 ,  H05H2007/088

Abstract: A cold stripper for a high-energy ion implanter system is provided. The cold stripper including a stripper tube having a hollow cavity, a first aperture in the stripper tube to admit an ion beam of positively charged ions into the hollow cavity and a second aperture in the stripper tube to discharge the ion beam from the hollow cavity, a gas pump coupled to the hollow cavity to introduce a gas into the hollow cavity, one or more cooling passages in the stripper tube, and a coolant pump coupled to the one or more cooling passages to circulate a coolant through the one or more cooling passages.

Abstract translation: 提供了一种用于高能离子注入机系统的冷汽提器。 所述冷汽提器包括具有中空腔的汽提管，所述汽提管中的第一孔，用于允许带正电荷的离子的离子束进入所述中空腔，并且所述汽提管中的第二孔用于从所述中空腔排出离子束， 耦合到所述中空腔的气泵以将气体引入所述中空腔，所述汽提管中的一个或多个冷却通道和联接到所述一个或多个冷却通道的冷却剂泵，以使冷却剂循环通过所述一个或多个冷却通道 。

公开(公告)号：US09514912B2

公开(公告)日：2016-12-06

申请号：US14523428

申请日：2014-10-24

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Costel Biloiu ,  Peter F. Kurunczi ,  Tyler Rockwell ,  Christopher Campbell ,  Vikram Singh ,  Svetlana Radovanov

IPC: H01J37/08 ,  H01J27/02 ,  H01J37/32 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/3171 ,  H01J37/32357 ,  H01J2237/061 ,  H01J2237/30472

Abstract: A processing apparatus may include: an extraction plate disposed along a side of a plasma chamber, the extraction plate having a first and second aperture, and middle portion between the first and second aperture, the first and second aperture being configured to define a first and second ion beam when the plasma is present in the plasma chamber and an extraction voltage is applied between the extraction plate and a substrate; a hidden deflection electrode disposed adjacent the middle portion outside of the plasma chamber, and electrically isolated from the extraction plate; and a hidden deflection electrode power supply to apply a bias voltage to the hidden deflection electrode, wherein the bias voltage is configured to modify a mean angle of incidence of ions and/or a range of angles of incidence centered around the mean angle of incidence in the first and second ion beam.

Abstract translation: 一种处理设备可以包括：提取板，沿着等离子体室的一侧设置，所述提取板具有第一和第二孔，以及在第一和第二孔之间的中间部分，第一和第二孔被配置为限定第一和第二孔 当等离子体存在于等离子体室中并且在提取板和基板之间施加提取电压时的第二离子束; 隐藏的偏转电极，设置在等离子体室外部的中间部分附近，并与提取板电隔离; 以及隐藏的偏转电极电源，用于向隐藏的偏转电极施加偏置电压，其中偏置电压被配置为修改离子的平均入射角和/或以入射角为中心的入射角范围， 第一和第二离子束。

公开(公告)号：US09502207B1

公开(公告)日：2016-11-22

申请号：US14835780

申请日：2015-08-26

Applicant: Axcelis Technologies, Inc.

Inventor： John F. Baggett ,  Jason R. Beringer

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J3/04 ,  H01J2237/061 ,  H01J2237/31701

Abstract: An ion source filament clamp has a clamp member having first and second ends. The first end has one of a cam surface and a cam follower, and has first and second portions that are opposed to one another and separated by a slot having a lead opening defined therein to receive a lead of an ion source filament. An actuator pin extends along an actuator pin axis and has first and second sections. The first section is coupled to the first portion of the clamp member. The actuator pin extends through, and is in sliding engagement with, a thru-hole in the second portion of the clamp member. A cam member is operably coupled to the second section of the actuator pin. The cam member has a handle and the other of the cam surface and cam follower and is configured to rotate between a clamped position and an unclamped position. The cam follower slidingly contacts the cam surface. In the clamped position, the cam follower engages the cam surface in a first predetermined manner, thus selectively compressing the first and second portions of the clamp member toward one another and exerting a clamping pressure on the lead within the lead opening while inducing a spring tension between the first and second portions of the clamp member. In the unclamped position, the cam follower engages the cam surface in a second predetermined manner, wherein the spring tension extends the first and second portions of the clamp member apart from one another, therein releasing the clamping pressure on the lead within the lead opening.

Abstract translation: 离子源灯丝夹具具有一个具有第一和第二端的夹紧件。 第一端具有凸轮表面和凸轮从动件中的一个，并且具有彼此相对并且由其中限定有引线开口的槽分隔开的第一和第二部分，以接收离子源灯丝的引线。 执行器销沿致动器销轴线延伸并具有第一和第二部分。 第一部分联接到夹紧构件的第一部分。 致动器销延伸穿过并且与夹紧构件的第二部分中的通孔滑动接合。 凸轮构件可操作地联接到致动器销的第二部分。 凸轮构件具有手柄和凸轮表面和凸轮从动件中的另一个，并且构造成在夹紧位置和未夹紧位置之间旋转。 凸轮从动件滑动地接触凸轮表面。 在夹紧位置中，凸轮从动件以第一预定方式接合凸轮表面，从而选择性地将夹紧构件的第一和第二部分彼此压缩并且在引导开口内的引线上施加夹紧压力，同时引起弹簧张力 在夹紧构件的第一和第二部分之间。 在松开位置，凸轮从动件以第二预定方式接合凸轮表面，其中弹簧张力将夹紧构件的第一和第二部分彼此分开延伸，从而在引线开口内释放引线上的夹持压力。

公开(公告)号：US20160260575A1

公开(公告)日：2016-09-08

申请号：US15059199

申请日：2016-03-02

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Moon Youn JUNG ,  Dong Hoon SONG ,  Jin Sun KIM

IPC: H01J37/06 ,  H01J37/244

CPC classification number: H01J37/06 ,  H01J3/024 ,  H01J2237/049 ,  H01J2237/061 ,  H01J2237/06325 ,  H01J2237/06366 ,  H01J2237/0656 ,  H01J2237/2482

Abstract: Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

Abstract translation: 可以提供电子束发生器，包括该电子束发生器的图像装置和光学装置。 光学装置包括在基板上提供第一和第二激光束的第一和第二激光装置，以及设置在第一和第二激光装置与基板之间以使第一和第二激光束聚焦的第一光学系统。 第一和第二激光束彼此重叠，产生干涉光束，从而将干涉光束的光点尺寸减小为小于焦点处的第一和第二激光束的波长的波长。