公开(公告)号：US20180247400A1

公开(公告)日：2018-08-30

申请号：US15964559

申请日：2018-04-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasutaka TOYODA ,  Norio HASEGAWA ,  Takeshi KATO ,  Hitoshi SUGAHARA ,  Yutaka HOJO ,  Daisuke HIBINO ,  Hiroyuki SHINDO

IPC: G06T7/00 ,  H01J37/22 ,  G01N23/2251 ,  H01J37/28 ,  H01L21/66 ,  G01N23/225

CPC classification number: G06T7/001 ,  G01N23/225 ,  G01N23/2251 ,  G01N2223/6113 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L22/12

Abstract: A pattern-measuring apparatus and a semiconductor-measuring system are provided which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In particular, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

公开(公告)号：US20160005157A1

公开(公告)日：2016-01-07

申请号：US14768600

申请日：2014-02-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yasutaka TOYODA ,  Norio HASEGAWA ,  Takeshi KATO ,  Hitoshi SUGAHARA ,  Yutaka HOJO ,  Daisuke HIBINO ,  Hiroyuki SHINDO

IPC: G06T7/00 ,  H01J37/28 ,  H01J37/22 ,  G01N23/225

CPC classification number: G06T7/001 ,  G01N23/225 ,  G01N23/2251 ,  G01N2223/6113 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L22/12

Abstract: An object of the present invention is to provide a pattern-measuring apparatus and a semiconductor-measuring system which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In the present invention for attaining the object described above, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

Abstract translation: 本发明的目的是提供一种图形测量装置和半导体测量系统，其能够获得关于半导体器件的适当选择处理的评估结果。 在本发明中，提出了一种图形测量装置，其包括将电子装置的电路图案与参考图形进行比较的运算装置，运算装置将电路图案分类为 基于电路图案和参考图案之间的测量结果与至少两个阈值的比较来确定电路图案。