公开(公告)号：US12156322B2

公开(公告)日：2024-11-26

申请号：US18077443

申请日：2022-12-08

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Frederick Marvin Niell, III ,  Donald K. Smith ,  Matthew M. Besen ,  Stephen F. Horne ,  David B. Reisman ,  Daniel J. Arcaro ,  Michael J. Roderick

IPC: H05H1/00 ,  H01J37/32 ,  H05H1/10

Abstract: A method and apparatus for generating light includes a chamber having a high voltage region, a low voltage region, and a plasma generation region that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma confinement region. A switched power supply includes a DC power supply and a switched resonant charging circuit that together generate a plurality of voltage pulses at the output causing a plurality of current pulses to be applied to the power delivery section around the magnetic core so that at least one plasma loop is established around the magnetic core that confines plasma in the plasma confinement region, thereby forming a magnetically confined Z-pinch plasma. Light generated by the Z-pinch plasma propagates out of a port in the light source.

公开(公告)号：US20240196506A1

公开(公告)日：2024-06-13

申请号：US18077443

申请日：2022-12-08

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Frederick Marvin Niell, III ,  Donald K. Smith ,  Matthew M. Besen ,  Stephen F. Horne ,  David B. Reisman ,  Daniel J. Arcaro ,  Michael J. Roderick

IPC: H05H1/10

CPC classification number: H05H1/10

Abstract: A method and apparatus for generating light includes a chamber having a high voltage region, a low voltage region, and a plasma generation region that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma confinement region. A switched power supply includes a DC power supply and a switched resonant charging circuit that together generate a plurality of voltage pulses at the output causing a plurality of current pulses to be applied to the power delivery section around the magnetic core so that at least one plasma loop is established around the magnetic core that confines plasma in the plasma confinement region, thereby forming a magnetically confined Z-pinch plasma. Light generated by the Z-pinch plasma propagates out of a port in the light source.

公开(公告)号：US20250069870A1

公开(公告)日：2025-02-27

申请号：US18940761

申请日：2024-11-07

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Stephen F. Horne ,  Kosuke Saito ,  Wolfram Neff ,  Robert M. Grzybinski ,  Michael J. Roderick

IPC: H01J37/32

Abstract: A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.

公开(公告)号：US20250056705A1

公开(公告)日：2025-02-13

申请号：US18928527

申请日：2024-10-28

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Frederick Marvin Niell, III ,  Donald K. Smith ,  Matthew M. Besen ,  Stephen F. Horne ,  David B. Reisman ,  Daniel J. Arcaro ,  Michael J. Roderick

IPC: H05H1/10

Abstract: A method and apparatus for generating light includes a chamber having a high voltage region, a low voltage region, and a plasma generation region that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma confinement region. A switched power supply includes a DC power supply and a switched resonant charging circuit that together generate a plurality of voltage pulses at the output causing a plurality of current pulses to be applied to the power delivery section around the magnetic core so that at least one plasma loop is established around the magnetic core that confines plasma in the plasma confinement region, thereby forming a magnetically confined Z-pinch plasma. Light generated by the Z-pinch plasma propagates out of a port in the light source.

公开(公告)号：US12165856B2

公开(公告)日：2024-12-10

申请号：US17676712

申请日：2022-02-21

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Stephen F. Horne ,  Kosuke Saito ,  Wolfram Neff ,  Robert M. Grzybinski ,  Michael J. Roderick

IPC: H01J37/32

Abstract: A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.

公开(公告)号：US20240194454A1

公开(公告)日：2024-06-13

申请号：US18077270

申请日：2022-12-08

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Donald K. Smith ,  Stephen F. Horne ,  Michael J. Roderick ,  Kosuke Saito ,  Wolfram Neff

IPC: H01J37/32 ,  H01J37/24

CPC classification number: H01J37/32449 ,  H01J37/241 ,  H01J37/32623 ,  H01J37/32834

Abstract: An ultraviolet light source with direct feed gas injection includes a chamber comprising a plasma confinement region and defining an aperture adjacent to the plasma confinement region that passes light generated by the plasma. A magnetic core is positioned around the plasma confinement region and is configured to generate a plurality of plasma current loops that converges in the plasma confinement region during operation. A feed gas injector is coupled to a gas port in the chamber and has an output that is positioned proximate to a boundary of the plasma confinement region so that the feed gas injector provides a feed gas to the plasma confinement region that creates a differential pressure in the plasma confinement region. A high voltage region is coupled to the plasma confinement region. An exhaust port is configured to be coupled to a pump that controls a pressure in the chamber.

公开(公告)号：US20230268167A1

公开(公告)日：2023-08-24

申请号：US17676712

申请日：2022-02-21

Applicant: Hamamatsu Photonics K.K. ,  Energetiq Technology, Inc.

Inventor： Stephen F. Horne ,  Kosuke Saito ,  Wolfram Neff ,  Robert M. Grzybinski ,  Michael J. Roderick

IPC: H01J37/32

CPC classification number: H01J37/32935 ,  H01J37/32357 ,  H01J37/3244

Abstract: A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.