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公开(公告)号:US20060092397A1
公开(公告)日:2006-05-04
申请号:US10979798
申请日:2004-11-03
IPC分类号: G03B27/54
CPC分类号: G03F7/70941 , G03F7/70558 , G03F7/70666
摘要: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
摘要翻译: 光刻设备包括用于提供投影辐射束的照明系统,用于支撑图案形成装置的支撑结构,所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案, 用于保持基板的基板台,以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器,用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率,可以确定透射率的总体(宏观)分布或图案形成装置的反射率。
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公开(公告)号:US20050174550A1
公开(公告)日:2005-08-11
申请号:US10964816
申请日:2004-10-15
申请人: Bob Streefkerk , Johannes Jacobus Baselmans , Adrianus Engelen , Jozef Finders , Paul Graeupner , Johannes Catharinus Mulkens , Jan Bernard Van Schoot
发明人: Bob Streefkerk , Johannes Jacobus Baselmans , Adrianus Engelen , Jozef Finders , Paul Graeupner , Johannes Catharinus Mulkens , Jan Bernard Van Schoot
IPC分类号: G03F7/20 , G03F7/207 , H01L21/027 , G03B27/52
CPC分类号: G03F7/70341 , G03F7/70333
摘要: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译: 在浸没光刻设备或设备制造方法中,在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中,焦点可以使用浸没式光刻设备的液体供应系统来改变。
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