CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES
    1.
    发明申请
    CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES 有权
    使用目标目标的CATOPR目标和系统

    公开(公告)号:US20110273791A1

    公开(公告)日:2011-11-10

    申请号:US13183823

    申请日:2011-07-15

    IPC分类号: G02B17/02

    摘要: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译: 通常,在一个方面,本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标,包括布置成将来自物体平面的辐射引导到图像平面的多个元件,其中物镜具有图像 侧面数值孔径大于0.55,最大像侧场尺寸大于1 mm,目标是一个反射目标。

    Catoptric Objectives And Systems Using Catoptric Objectives
    2.
    发明申请
    Catoptric Objectives And Systems Using Catoptric Objectives 有权
    使用图解目标的图解目标和系统

    公开(公告)号:US20100134908A1

    公开(公告)日:2010-06-03

    申请号:US12700169

    申请日:2010-02-04

    IPC分类号: G02B5/10

    摘要: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译: 通常,在一个方面,本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标,包括布置成将来自物体平面的辐射引导到图像平面的多个元件,其中物镜具有图像 侧面数值孔径大于0.55,最大像侧场尺寸大于1 mm,目标是一个反射目标。

    Catoptric objectives and systems using catoptric objectives
    3.
    发明授权
    Catoptric objectives and systems using catoptric objectives 失效
    使用反射目标的目标和系统

    公开(公告)号:US07682031B2

    公开(公告)日:2010-03-23

    申请号:US11317851

    申请日:2005-12-22

    IPC分类号: G02B5/10

    摘要: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译: 通常,在一个方面,本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标,包括布置成将来自物体平面的辐射引导到图像平面的多个元件,其中物镜具有图像 侧面数值孔径大于0.55,最大像侧场尺寸大于1 mm,目标是一个反射目标。

    CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES
    4.
    发明申请
    CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES 审中-公开
    使用目标目标的CATOPR目标和系统

    公开(公告)号:US20080316451A1

    公开(公告)日:2008-12-25

    申请号:US12198344

    申请日:2008-08-26

    IPC分类号: G03F7/20

    摘要: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译: 通常,在一个方面,本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标,包括布置成将来自物体平面的辐射引导到图像平面的多个元件,其中物镜具有图像 侧面数值孔径大于0.55,最大像侧场尺寸大于1 mm,目标是一个反射目标。

    Catoptric objectives and systems using catoptric objectives
    5.
    发明申请
    Catoptric objectives and systems using catoptric objectives 失效
    使用反射目标的目标和系统

    公开(公告)号:US20060232867A1

    公开(公告)日:2006-10-19

    申请号:US11317851

    申请日:2005-12-22

    IPC分类号: G02B5/10

    摘要: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译: 通常,在一个方面,本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标,包括布置成将来自物体平面的辐射引导到图像平面的多个元件,其中物镜具有图像 侧面数值孔径大于0.55,最大像侧场尺寸大于1 mm,目标是一个反射目标。

    CATADIOPTRIC PROJECTION OBJECTIVE
    10.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号:US20110235167A1

    公开(公告)日:2011-09-29

    申请号:US13153544

    申请日:2011-06-06

    IPC分类号: G02B17/08

    摘要: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

    摘要翻译: 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括:用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分,用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间,第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。