摘要:
A paper supply device for an electrostatic photographic printer which can significantly reduce the area for installation of the printer. A housing of the printer includes a base and a cover connected for pivotal motion in a vertical plane relative to each other. A picture image forming means including a photosensitive member and so on is mounted on the base. A paper supply cassette is mounted on the cover. Paper is drawn out from the paper supply cassette by means of a paper supply roller and then guided to the picture image forming means by a paper guide which includes a guide plate mounted on the cover and another guide plate mounted on the base and disposed in opposing relationship to the guide plate on the cover. A gear wheel connected to the paper supply roll is meshed, when the cover is closed, with another driving gear wheel mounted on the base and connected to a motor. An engaging member is also provided on the cover and urged to engage with and hold the paper supply cassette from dropping off the cover.
摘要:
According to the present invention, an upper body which is relatively light in weight is connected to a lower body which contains a paper conveying path and a transfer portion disposed in the paper conveying path, and support portions formed in the lower body are brought into abutment with an image forming portion comprising an image carrier unit and a developing unit, the image carrier unit having an image carrier, and in this state the image forming portion is fixed by a retaining device.
摘要:
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要:
During closer inspection with a local defect area being magnified, it is desirable to reduce image acquisition time by making the number of stage moves as few as possible so that a defect can be observed efficiently. To accomplish this, the invention offers a method of observing samples characterized by: acquiring a reference sample image not including any defect on a sample by capturing an image of the sample, based on the information on the defect developed on the sample and detected by an inspection apparatus; adjusting the position of the sample so that the defect will fall within the field of view of image capture, based on the above information; acquiring a defective sample image including the defect on the sample by capturing an image of the sample in the adjusted position; locating the defect on the defective sample image by comparing the reference sample image and the defective sample image; acquiring a magnified image of the defect by capturing a magnified view of the local area where the located defect exists within the field of view of image capture; and displaying the magnified image of the defect on a screen.
摘要:
A slice selection gradient magnetic field used in a pulse sequence for generating a spin echo signal is applied in such a fashion that its polarity at the time of a 90.degree. pulse becomes opposite to the one at the time of 180.degree. pulse, in order to expand a dynamic range of blood flow speed measurement. When the blood flow speed contains a component in a slice vertical direction, the gradient magnetic field in the slice vertical direction is adjusted so that the phase changes of two sets of flow encoded pulses contained in the slice vertical direction are opposite to each other.The flow speed in the direction of the readout gradient magnetic field, which is a lateral direction of the slice plane, is purely measured by canceling influences of the flow in the slice vertical direction.
摘要:
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要:
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要:
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要:
An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.
摘要:
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.