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    CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS
    1.
    发明申请
    CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
    充电颗粒光束对准方法和充电颗粒光束装置

    公开(公告)号：US20100006755A1

    公开(公告)日：2010-01-14

    申请号：US12564511

    申请日：2009-09-22

    申请人： Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

    发明人： Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

    IPC分类号： G01N23/22

    CPC分类号： H01J37/1471 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/153

    摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

    摘要翻译： 本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准 。 本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择 提供了一种计算方法。

    Method of forming a sample image and charged particle beam apparatus
    4.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 有权
    形成样品图像和带电粒子束装置的方法

    公开(公告)号：US07800059B2

    公开(公告)日：2010-09-21

    申请号：US12073359

    申请日：2008-03-04

    申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    IPC分类号： G01N23/22 ,  H01J37/26 ,  H01J37/28 ,  G21K7/00

    CPC分类号： G01N23/22 ,  H01J37/222 ,  H01J37/28

    摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

    Method of forming a sample image and charged particle beam apparatus
    5.
    发明申请
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号：US20070029478A1

    公开(公告)日：2007-02-08

    申请号：US11501229

    申请日：2006-08-09

    申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    IPC分类号： G21K7/00

    CPC分类号： H01J37/28 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10056 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/226

    摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

    Method of forming a sample image and charged particle beam apparatus
    9.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号：US07361894B2

    公开(公告)日：2008-04-22

    申请号：US11501229

    申请日：2006-08-09

    申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    IPC分类号： G01N23/22 ,  H01J37/26 ,  H01J37/28 ,  G21K7/00

    CPC分类号： H01J37/28 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10056 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/226

    摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

    Method for measuring dimensions of sample and scanning electron microscope
    10.
    发明授权
    Method for measuring dimensions of sample and scanning electron microscope 有权
    测量样品和扫描电子显微镜尺寸的方法

    公开(公告)号：US07659508B2

    公开(公告)日：2010-02-09

    申请号：US10450852

    申请日：2002-03-27

    申请人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

    发明人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

    IPC分类号： H01J37/28 ,  G01N23/225

    CPC分类号： H01J37/28 ,  G01B15/00 ,  G01N23/225 ,  H01J2237/2814

    摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

    摘要翻译： 本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。 在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。