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公开(公告)号:US08241550B2
公开(公告)日:2012-08-14
申请号:US12574211
申请日:2009-10-06
IPC分类号: B29C59/00
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译: 公开了一种压印光刻设备,其具有被配置为保持压印模板,衬底台和光学编码器的模板保持器,所述光学编码器具有辐射输出,第一衍射光栅和检测器,所述辐射输出被布置成照亮 第二衍射光栅和检测器,定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
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公开(公告)号:US07708924B2
公开(公告)日:2010-05-04
申请号:US11185971
申请日:2005-07-21
IPC分类号: B28B11/08
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译: 公开了一种光刻设备,其具有被配置为保持压印模板的模板保持器,布置成接收衬底的衬底台,布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号:US20100084565A1
公开(公告)日:2010-04-08
申请号:US12574211
申请日:2009-10-06
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译: 公开了一种压印光刻设备,其具有被配置为保持压印模板,衬底台和光学编码器的模板保持器,所述光学编码器具有辐射输出,第一衍射光栅和检测器,所述辐射输出被布置成照亮 第二衍射光栅和检测器,定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
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公开(公告)号:US07922474B2
公开(公告)日:2011-04-12
申请号:US11155941
申请日:2005-02-17
申请人: Yvonne Wendela Kruijt-Stegeman , Henricus Wilhelmus Aloysius Janssen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人: Yvonne Wendela Kruijt-Stegeman , Henricus Wilhelmus Aloysius Janssen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要: An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.
摘要翻译: 公开了一种压印方法,其包括对模板施加压印力,以使得模板在施加压印力的同时在介质的第一表面的目标区域上接触可压印的介质以形成印记, 对基板的与第一表面相对的第二表面的补偿力,以减少由施加压印力引起的基板的变形,以及将模板与压印介质分离。
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公开(公告)号:US07692771B2
公开(公告)日:2010-04-06
申请号:US11138899
申请日:2005-05-27
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00
摘要: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
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公开(公告)号:US07618250B2
公开(公告)日:2009-11-17
申请号:US11440439
申请日:2006-05-25
IPC分类号: B29C59/00
CPC分类号: B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译: 公开了一种压印光刻设备,其具有被配置为保持压印模板,衬底台和光学编码器的模板保持器,所述光学编码器具有辐射输出,第一衍射光栅和检测器,所述辐射输出被布置成照亮 第二衍射光栅和检测器,定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
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公开(公告)号:US07377764B2
公开(公告)日:2008-05-27
申请号:US11150465
申请日:2005-06-13
申请人: Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
发明人: Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
IPC分类号: B28B11/08
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00
摘要: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译: 公开了一种光刻设备,其具有构造成保持压印模板的压印模板或模板保持器,以及布置成接收衬底的衬底台,该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。
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公开(公告)号:US20090212462A1
公开(公告)日:2009-08-27
申请号:US12391954
申请日:2009-02-24
申请人: Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
发明人: Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
CPC分类号: B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译: 公开了一种压印光刻设备,其具有模板保持器的第一阵列,模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台,其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板,并且第二阵列的模板支架被布置成保持压印模板阵列,其可用于将第二阵列阵列印刷到基底上,所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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公开(公告)号:US08753557B2
公开(公告)日:2014-06-17
申请号:US13331985
申请日:2011-12-20
申请人: Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
发明人: Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
IPC分类号: B28B11/08
CPC分类号: B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译: 公开了一种压印光刻设备,其具有模板保持器的第一阵列,模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台,其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板,并且第二阵列的模板支架被布置成保持压印模板阵列,其可用于将第二阵列阵列印刷到基底上,所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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公开(公告)号:US07517211B2
公开(公告)日:2009-04-14
申请号:US11312659
申请日:2005-12-21
申请人: Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
发明人: Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
IPC分类号: B29C59/00
CPC分类号: B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译: 公开了一种压印光刻设备,其具有模板保持器的第一阵列,模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台,其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板,并且第二阵列的模板支架被布置成保持压印模板阵列,其可用于将第二阵列阵列印刷到基底上,所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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