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公开(公告)号:US07929227B2
公开(公告)日:2011-04-19
申请号:US12829491
申请日:2010-07-02
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号: G02B7/02
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。
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公开(公告)号:US08570676B2
公开(公告)日:2013-10-29
申请号:US13046170
申请日:2011-03-11
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号: G02B7/02
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。
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公开(公告)号:US07791826B2
公开(公告)日:2010-09-07
申请号:US11814713
申请日:2006-01-26
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号: G02B7/02
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。
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公开(公告)号:US20110181857A1
公开(公告)日:2011-07-28
申请号:US13046170
申请日:2011-03-11
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号: G03B27/54
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。
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公开(公告)号:US20100271607A1
公开(公告)日:2010-10-28
申请号:US12829491
申请日:2010-07-02
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号: G03B27/42
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。
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公开(公告)号:US20080170303A1
公开(公告)日:2008-07-17
申请号:US11814713
申请日:2006-01-26
申请人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人: Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
CPC分类号: G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要: Optical assembly supported in an arrangement, especially in an objective (1, 8) or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens (34, 35), a mirror, or an aperture (9), wherein the at least one element is influenceable by at least one manipulator and wherein (i) the at least one manipulator (10, 22, 25) is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator (10, 22, 25) and the element to be influenced by the manipulator (10, 22, 25) in the interior of the arrangement, (ii) the manipulator comprises a mechanism for adjusting precisely or for micro-adjusting of the optical element, or (iii) the manipulator comprises a first and a second means wherein the first means generates a repelling force and/or a repelling torque and the second means (5, 6, 11, 15, 19) counteracts the repelling force and/or the repelling torque generated by the first means and at least partially compensates for the force and/or the torque generated by the first means.
摘要翻译: 光学组件以特别是在物镜(1,8)中或在照明或曝光系统中的布置中支撑,所述光学组件包括至少一个光学元件,特别是透镜(34,35),镜子或 孔(9),其中所述至少一个元件可由至少一个操纵器影响,并且其中(i)所述至少一个操纵器(10,22,25)被布置在所述壳体外部或者设置在保持装置 通过解耦装置的帮助完全或大部分地分离,并且提供了操纵器(10,22,25)与受机械手(10,22,25)影响的元件之间的有效耦合。 该装置的内部,(ii)操纵器包括用于精确调整或用于微调光学元件的机构,或(iii)操纵器包括第一和第二装置,其中第一装置产生排斥力和/ 或排斥扭矩,第二 装置(5,6,11,15,19)抵消由第一装置产生的排斥力和/或排斥扭矩,并且至少部分地补偿由第一装置产生的力和/或扭矩。
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公开(公告)号:US20120075611A1
公开(公告)日:2012-03-29
申请号:US13307550
申请日:2011-11-30
申请人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号: G03B27/72
CPC分类号: G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译: 本发明涉及一种光学成像装置,特别是用于制造半导体元件的EUVL领域的微光刻物镜1,其具有光束路径2,多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a,7b,其具有多个不同的隔膜开口6,每个隔膜开口6在每种情况下具有固定的形状,可以将其引入光束路径2。
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公开(公告)号:US08089707B2
公开(公告)日:2012-01-03
申请号:US12700351
申请日:2010-02-04
申请人: Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
发明人: Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号: G02B9/00
CPC分类号: G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译: 本发明涉及一种光学成像装置,特别是用于制造半导体元件的EUVL领域的微光刻物镜1,其具有光束路径2,多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a,7b,其具有多个不同的隔膜开口6,每个隔膜开口6在每种情况下具有固定的形状,可以将其引入光束路径2。
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公开(公告)号:US20100134777A1
公开(公告)日:2010-06-03
申请号:US12700351
申请日:2010-02-04
申请人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
CPC分类号: G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译: 本发明涉及一种光学成像装置,特别是用于制造半导体元件的EUVL领域的微光刻物镜1,其具有光束路径2,多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a,7b,其具有多个不同的隔膜开口6,每个隔膜开口6在每种情况下具有固定的形状,可以将其引入光束路径2。
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公开(公告)号:US07684125B2
公开(公告)日:2010-03-23
申请号:US10595583
申请日:2003-12-18
申请人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
发明人: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
IPC分类号: G02B9/00
CPC分类号: G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译: 本发明涉及一种光学成像装置,特别是用于制造半导体元件的EUVL领域的微光刻物镜1,其具有光束路径2,多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a,7b,其具有多个不同的隔膜开口6,每个隔膜开口6在每种情况下具有固定的形状,可以将其引入光束路径2。
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