公开(公告)号：US07886427B2

公开(公告)日：2011-02-15

申请号：US10582779

申请日：2004-12-15

申请人： Hideki Uchida ,  Risa Sakurai ,  Shin-ichiro Endo ,  Kazuo Kido

发明人： Hideki Uchida ,  Risa Sakurai ,  Shin-ichiro Endo ,  Kazuo Kido

IPC分类号： H05K13/04

CPC分类号： H05K13/0409 ,  Y10T29/53174 ,  Y10T29/53178 ,  Y10T29/53191

摘要： A suction-and-holding face for a component in a suction nozzle is formed from a semiconductor ceramic so that the suction-and-holding face to be brought into direct contact with the component in suction and holding has the characteristics of a semiconductor. Thus, detrimental effects due to static electricity on the suction nozzle as well as detrimental effects due to electrical conduction between the suction nozzle and the component can be prevented from occurring.

摘要翻译： 吸入嘴中的部件的吸引保持面由半导体陶瓷形成，使得与抽吸保持部件直接接触的吸引保持面具有半导体的特性。 因此，可以防止由于吸嘴上的静电引起的有害影响以及由于吸嘴与部件之间的电导致的不利影响。

公开(公告)号：US20070289125A1

公开(公告)日：2007-12-20

申请号：US10582779

申请日：2004-12-15

申请人： Hideki Uchida ,  Risa Sakurai ,  Shin-ichiro Endo ,  Kazuo Kido

发明人： Hideki Uchida ,  Risa Sakurai ,  Shin-ichiro Endo ,  Kazuo Kido

IPC分类号： B23P19/00

CPC分类号： H05K13/0409 ,  Y10T29/53174 ,  Y10T29/53178 ,  Y10T29/53191

摘要： A suction-and-holding face (14) for a component (1) in a suction nozzle (3) is formed from a semiconductor ceramic so that the suction-and-holding face to be brought into direct contact with the component in suction and holding has characteristics as semiconductor. Thus, detrimental effects due to occurrence of static electricity on the suction nozzle as well as detrimental effects due to an electrical conduction state between the suction nozzle and the component can be prevented from occurring.

摘要翻译： 用于吸嘴（3）中的部件（1）的吸持和保持面（14）由半导体陶瓷形成，使得吸入保持面与抽吸部件直接接触， 保持具有半导体的特点。 因此，可以防止由于吸嘴上的静电产生的不利影响以及由于吸嘴和部件之间的导电状态而引起的不利影响。