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    Stress adjustment method of X-ray mask
    4.
    发明授权
    Stress adjustment method of X-ray mask 失效
    X射线掩模的应力调整方法

    公开(公告)号：US06265113B1

    公开(公告)日：2001-07-24

    申请号：US09116334

    申请日：1998-07-16

    申请人： Hideki Yabe ,  Kaeko Kitamura ,  Kenji Marumoto ,  Sunao Aya ,  Koji Kise

    发明人： Hideki Yabe ,  Kaeko Kitamura ,  Kenji Marumoto ,  Sunao Aya ,  Koji Kise

    IPC分类号： G03F900

    CPC分类号： G03F1/22

    摘要： An X-ray absorber is deposited on a membrane. A stress adjust step is applied so that the average film stress of the X-ray absorber is 0. After patterning the X-ray absorber, the position accuracy of the pattern is measured. Then, a stress adjust process is applied to the patterned X-ray mask. Accordingly, a stress adjustment method is used to acquire an X-ray mask that has no pattern position offset of the X-ray absorber.

    摘要翻译： 在膜上沉积X射线吸收剂。 施加应力调整步骤，使得X射线吸收体的平均膜应力为0.在对X射线吸收体进行图案化之后，测量图案的位置精度。 然后，对图案化的X射线掩模施加应力调整处理。 因此，使用应力调整方法来获取没有X射线吸收体的图案位置偏移的X射线掩模。

    X-ray mask provided with an alignment mark and method of manufacturing the same
    5.
    发明授权
    X-ray mask provided with an alignment mark and method of manufacturing the same 失效
    具有对准标记的X射线掩模及其制造方法

    公开(公告)号：US06212252B1

    公开(公告)日：2001-04-03

    申请号：US09177826

    申请日：1998-10-23

    申请人： Koji Kise ,  Hideki Yabe ,  Sunao Aya ,  Kaeko Kitamura ,  Kenji Marumoto ,  Shigeto Ami

    发明人： Koji Kise ,  Hideki Yabe ,  Sunao Aya ,  Kaeko Kitamura ,  Kenji Marumoto ,  Shigeto Ami

    IPC分类号： G21K500

    CPC分类号： G03F1/22 ,  G03F1/42 ,  G03F9/7076

    摘要： An X-ray mask which is provided with an alignment mark and a transfer circuit pattern having a high position accuracy can be manufactured through a simplified manufacturing process. A membrane allowing passage of X-rays is formed on a substrate. A X-ray absorber intercepting transmission of X-rays is formed on the membrane. The substrate includes a window exposing the membrane. The X-ray absorber includes a transfer circuit pattern and an alignment mark formed in a region not overlapping with the window in a plan view.

    摘要翻译： 可以通过简化的制造工艺制造具有对准标记的X射线掩模和具有高定位精度的传输电路图案。在基板上形成允许X射线通过的膜。 在膜上形成截止X射线透射的X射线吸收器。 衬底包括暴露膜的窗口。 X射线吸收体包括在平面图中形成在与窗不重叠的区域中的转印电路图案和对准标记。

    Method of manufacturing X-ray mask and heating apparatus
    6.
    发明授权
    Method of manufacturing X-ray mask and heating apparatus 失效
    制造X射线掩模和加热装置的方法

    公开(公告)号：US5953492A

    公开(公告)日：1999-09-14

    申请号：US975112

    申请日：1997-11-20

    申请人： Hideki Yabe ,  Kenji Marumoto ,  Sunao Aya ,  Koji Kise ,  Hiroaki Sumitani ,  Takashi Hifumi ,  Hiroshi Watanabe

    发明人： Hideki Yabe ,  Kenji Marumoto ,  Sunao Aya ,  Koji Kise ,  Hiroaki Sumitani ,  Takashi Hifumi ,  Hiroshi Watanabe

    IPC分类号： G03F1/22 ,  H01L21/027 ,  H01L21/324 ,  G03F9/00 ,  H05B3/20

    CPC分类号： G03F1/22

    摘要： The X-ray mask manufactured according to the present invention can solve a problem that the thin film stress of the X-ray absorber cannot be made to be zero although the mean thin film stress throughout the X-ray absorber can be made to be zero. The thin film stress distribution over the X-ray absorber 4 after the X-ray absorber 4 has been formed on a silicon substrate 1 is measured, and then inputs of electric power to heaters 9a, 9b and 9c of a hot plate 8 are changed so as to heat the X-ray absorber 4 to temperatures according to a specified temperature distribution with which the thin film stress throughout the X-ray absorber can be made to be zero.

    摘要翻译： 根据本发明制造的X射线掩模可以解决尽管X射线吸收体中的平均薄膜应力可以为零，但X射线吸收体的薄膜应力不能为零的问题 。 测量在硅基板1上形成X射线吸收体4之后的X射线吸收体4上的薄膜应力分布，然后改变对热板8的加热器9a，9b，9c的电力输入 以便将X射线吸收体4根据可以使整个X射线吸收体中的薄膜应力为零的规定的温度分布加热到温度。