ANTI-REFLECTION COATING, OPTICAL MEMBER COMPRISING IT, AND EXCHANGE LENS UNIT AND IMAGING DEVICE COMPRISING SUCH OPTICAL MEMBER
    1.
    发明申请
    ANTI-REFLECTION COATING, OPTICAL MEMBER COMPRISING IT, AND EXCHANGE LENS UNIT AND IMAGING DEVICE COMPRISING SUCH OPTICAL MEMBER 审中-公开
    防反射涂层,包含它的光学构件和交换镜头单元和包含这种光学构件的成像装置

    公开(公告)号:US20100027123A1

    公开(公告)日:2010-02-04

    申请号:US12510454

    申请日:2009-07-28

    IPC分类号: G02B1/11 B32B5/22

    CPC分类号: G02B1/115 Y10T428/249986

    摘要: An anti-reflection coating laminated on a substrate, wherein in a wavelength range of 400-700 nm, the substrate has a refractive index of 1.45-1.72, the first layer is based on alumina, the second to sixth layers are dense layers having refractive indices of 1.95-2.23, 1.33-1.50, 2.04-2.24, 1.33-1.50 and 1.85-2.40, respectively, the seventh layer is composed of nanometer-sized, mesoporous silica particles, and the first to seventh layers have optical thicknesses of 25.0-250.0 nm, 27.5-52.5 nm, 37.5-54.0 nm, 45.0-62.5 nm, 77.5-102.5 nm, 16.0-26.5 nm and 112.5-162.5 nm, respectively.

    摘要翻译: 一种层叠在基板上的防反射涂层,其中在400-700nm的波长范围内,所述基板的折射率为1.45-1.72,所述第一层为氧化铝,所述第二至第六层为具有折射率 指数分别为1.95-2.23,1.33-1.50,2.04-2.24,1.33-1.50和1.85-2.40,第七层由纳米级的介孔二氧化硅颗粒组成,第一至第七层的光学厚度为25.0〜 250.0nm,27.5-52.5nm,37.5-54.0nm,45.0-62.5nm,77.5-102.5nm,16.0-26.5nm和112.5-162.5nm。

    METHOD FOR FORMING MESOPOROUS SILICA LAYER, ITS POROUS COATING, ANTI-REFLECTION COATING, AND OPTICAL MEMBER
    3.
    发明申请
    METHOD FOR FORMING MESOPOROUS SILICA LAYER, ITS POROUS COATING, ANTI-REFLECTION COATING, AND OPTICAL MEMBER 审中-公开
    形成多孔二氧化硅层,其多孔涂层,抗反射涂层和光学部件的方法

    公开(公告)号:US20100136319A1

    公开(公告)日:2010-06-03

    申请号:US12610530

    申请日:2009-11-02

    摘要: A method for forming a mesoporous silica layer composed of nanometer-sized, mesoporous silica particles on an optical substrate or a dense layer formed thereon, comprising the steps of (1) hydrolyzing and polycondensing alkoxysilane in a solvent containing a catalyst, a cationic surfactant and a nonionic surfactant to prepare composites comprising nanometer-sized, mesoporous silica particles and these surfactants, (2) applying a solution containing the composites to the substrate or the dense layer, (3) drying the solution to remove the solvent, and (4) removing both surfactants by baking the resultant coating at 120-250° C. in an oxygen-containing gas atmosphere, or plasma-treating it using an oxygen-containing gas.

    摘要翻译: 一种形成由光学基板或其上形成的致密层上的纳米尺寸的介孔二氧化硅颗粒构成的介孔二氧化硅层的方法,包括以下步骤:(1)将含有催化剂,阳离子表面活性剂和溶剂的溶剂中的烷氧基硅烷水解和缩聚, 制备包含纳米尺寸的介孔二氧化硅颗粒和这些表面活性剂的复合材料的非离子表面活性剂,(2)将含有复合材料的溶液施加到基底或致密层,(3)干燥溶液以除去溶剂,和(4) 通过在含氧气体气氛中在120-250℃下烘烤所得到的涂层,或者使用含氧气体进行等离子体处理来除去两种表面活性剂。

    SYNTHETIC RESIN CONTAINER
    4.
    发明申请

    公开(公告)号:US20180093789A1

    公开(公告)日:2018-04-05

    申请号:US15570716

    申请日:2016-04-08

    IPC分类号: B65D1/02 B65D1/42

    摘要: A synthetic resin container that effectively absorbs reduced pressure generated inside the container due to hot filling to maintain the appearance and shape. A synthetic resin container includes a mouth as a dispensing spout for a content medium, a trunk, extending contiguous to the mouth via a shoulder, and a bottom, closing a lower end of the trunk. The trunk is provided with reduced pressure absorbing panels, which are formed as ribs extending in the vertical direction while twisting in the circumferential direction about a central axis of the trunk and which are arranged side by side in the circumferential direction of the trunk. Twist angle of a lower end with respect to an upper end of each reduced pressure absorbing panel about the central axis is 50 degrees or more.