公开(公告)号：USD720309S1

公开(公告)日：2014-12-30

申请号：US29420537

申请日：2012-05-10

申请人： Hirofumi Kaneko ,  Atsushi Endo

设计人： Hirofumi Kaneko ,  Atsushi Endo

公开(公告)号：USD720308S1

公开(公告)日：2014-12-30

申请号：US29420536

申请日：2012-05-10

申请人： Hirofumi Kaneko ,  Atsushi Endo

设计人： Hirofumi Kaneko ,  Atsushi Endo

公开(公告)号：USD725053S1

公开(公告)日：2015-03-24

申请号：US29420534

申请日：2012-05-10

申请人： Hirofumi Kaneko ,  Atsushi Endo

设计人： Hirofumi Kaneko ,  Atsushi Endo

公开(公告)号：USD724551S1

公开(公告)日：2015-03-17

申请号：US29420539

申请日：2012-05-10

申请人： Hirofumi Kaneko ,  Atsushi Endo

设计人： Hirofumi Kaneko ,  Atsushi Endo

公开(公告)号：US07798811B2

公开(公告)日：2010-09-21

申请号：US12000678

申请日：2007-12-14

申请人： Hiromi Nitadori ,  Hirofumi Kaneko

发明人： Hiromi Nitadori ,  Hirofumi Kaneko

IPC分类号： F27D3/12

CPC分类号： F27B17/0025

摘要： A vertical type heat processing apparatus prevents falling-down of a boat placed on a heat insulating mount due to an external force, such as an earthquake. The apparatus includes a heating furnace having a furnace port, a cover, a pair of substrate holding tools, each to be placed on the cover via a heat insulating mount and to hold multiple substrates, a rotating mechanism, and a lifting mechanism to raise and lower the cover to carry in and carry out the substrate holding tool relative to the furnace. While one of the substrate holding tools is located in the furnace, the other is placed on a table, for loading the substrates. Each substrate holding tool is carried between the table and the heat insulating mount due to a carrier mechanism. Further, a locking part and a part to be locked can be engaged with each other.

摘要翻译： 垂直式热处理装置防止由于诸如地震等外力而放置在隔热安装座上的船的落下。 该装置包括具有炉口，加热罩，一对基板保持工具的加热炉，每个基板保持工具通过隔热安装座放置在盖上并保持多个基板，旋转机构和提升机构， 降低盖子以携带并相对于炉子执行基板固定工具。 当基板保持工具中的一个位于炉中时，另一个放置在工作台上，用于装载基板。 每个基板保持工具由于载体机构而被承载在工作台和隔热安装座之间。 此外，锁定部分和待锁定的部分可以彼此接合。

公开(公告)号：USD570309S1

公开(公告)日：2008-06-03

申请号：US29274445

申请日：2007-04-24

申请人： Izumi Sato ,  Hirofumi Kaneko

设计人： Izumi Sato ,  Hirofumi Kaneko

公开(公告)号：US07120773B2

公开(公告)日：2006-10-10

申请号：US10701073

申请日：2003-11-05

申请人： Shirou Yoshioka ,  Hirofumi Kaneko

发明人： Shirou Yoshioka ,  Hirofumi Kaneko

IPC分类号： G06F12/02

CPC分类号： G06F12/1027 ,  G06F12/0238 ,  G06F12/0802 ,  G06F12/0804

摘要： A TLB provided in a memory management apparatus stores an entry for each logical page, and each entry holds an address of a physical page mapped to a corresponding logical page, an index showing the degradation degree of the physical page, and an index showing the access frequency to the logical page. The memory management apparatus accesses a physical page mapped to a desired logical page according to the data stored in the TLB, periodically exchanges the contents between a first physical page mapped to a specific logical page having a largest access frequency index and a second physical page having a smallest degradation index, and then maps the specific logical page to the second physical page. Through the physical page exchange and corresponding mapping process, accesses to each physical page are distributed, so that degradation in storage function is substantially equalized.

摘要翻译： 提供在存储器管理装置中的TLB存储每个逻辑页的条目，并且每个条目保存映射到相应逻辑页的物理页的地址，表示物理页的劣化程度的索引以及显示访问的索引 频率到逻辑页面。 存储器管理装置根据存储在TLB中的数据访问映射到期望逻辑页面的物理页面，周期性地交换映射到具有最大访问频率索引的特定逻辑页面的第一物理页面和具有最大访问频率索引的第二物理页面之间的内容， 最小的降级索引，然后将特定的逻辑页面映射到第二个物理页面。 通过物理页面交换和相应的映射过程，对每个物理页面的访问进行分发，从而大大平衡了存储功能的降级。

公开(公告)号：US08216378B2

公开(公告)日：2012-07-10

申请号：US12408977

申请日：2009-03-23

申请人： Hirofumi Kaneko ,  Hisashi Inoue ,  Keishi Shionaga ,  Shingo Hishiya ,  Atsushi Endoh

发明人： Hirofumi Kaneko ,  Hisashi Inoue ,  Keishi Shionaga ,  Shingo Hishiya ,  Atsushi Endoh

IPC分类号： C23C16/00

CPC分类号： H01L21/67109

摘要： A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall.

摘要翻译： 用于对在真空状态下间隔堆叠的多个目标物体进行热处理的半导体工艺的反应管由电绝缘和耐热材料一体地形成。 反应管包括圆筒形侧壁，其具有位于下端的负载端口，用于将目标物体装载到反应管和从反应管卸载目标物体，以及圆形顶壁，其关闭侧壁的上端并具有平坦的内表面延伸 在垂直于侧壁的轴向的方向上。 顶壁具有形成在沿侧壁的外表面的周边区域中的环形槽。

公开(公告)号：US20090250005A1

公开(公告)日：2009-10-08

申请号：US12408977

申请日：2009-03-23

申请人： Hirofumi Kaneko ,  Hisashi Inoue ,  Keishi Shionaga ,  Shingo Hishiya ,  Atsushi Endoh

发明人： Hirofumi Kaneko ,  Hisashi Inoue ,  Keishi Shionaga ,  Shingo Hishiya ,  Atsushi Endoh

IPC分类号： C23C16/00

CPC分类号： H01L21/67109

摘要： A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall.

摘要翻译： 用于对在真空状态下间隔堆叠的多个目标物体进行热处理的半导体工艺的反应管由电绝缘和耐热材料一体地形成。 反应管包括圆筒形侧壁，其具有位于下端的负载端口，用于将目标物体装载到反应管和从反应管卸载目标物体，以及圆形顶壁，其关闭侧壁的上端并具有平坦的内表面延伸 在垂直于侧壁的轴向的方向上。 顶壁具有形成在沿侧壁的外表面的周边区域中的环形槽。

公开(公告)号：US20080153049A1

公开(公告)日：2008-06-26

申请号：US12000678

申请日：2007-12-14

申请人： Hiromi Nitadori ,  Hirofumi Kaneko

发明人： Hiromi Nitadori ,  Hirofumi Kaneko

IPC分类号： F27D5/00 ,  F27D3/12

CPC分类号： F27B17/0025

摘要： The present invention provides a vertical type heat processing apparatus, which can prevent falling-down of a boat placed on a heat insulating mount due to an external force, such as an earthquake, by employing a simple structure, while taking a form of the so-called two-boat system. The vertical-type heat processing apparatus comprises a heating furnace 5 having a furnace port 5a formed at a bottom portion thereof, a cover 17 adapted to close the furnace port 5a, a pair of substrate holding tools 4, each configured to be placed on the cover 17 via a heat insulating mount 19 and adapted to hold multiple substrates W in a multistage fashion, a rotating mechanism 20 provided to the cover 17 and adapted to rotate the substrate holding tool 4, and a lifting mechanism 18 adapted to raise and lower the cover 17 so as to carry in and carry out the substrate holding tool 4 relative to the furnace 5. While one of the substrate holding tools 4 is located in the furnace 5, the other substrate holding tool 4 is paced on a table 22, for loading the substrates. Each substrate holding tool 4 is carried between the table 22 and the heat insulating mount 19 due to a carrier mechanism 23. A locking part 25 and a part 26 to be locked are provided to a bottom portion of each substrate holding tool 4 and an upper portion of the heat insulating mount 19, respectively, such that the locking part 25 and the part 26 to be locked can be engaged with each other, by rotating the heat insulating mount 19 a predetermined angle by the rotating mechanism 20, while the substrate holding tool 4 is held just above the heat insulating mount 19 due to the carrier mechanism 23.

摘要翻译： 本发明提供了一种垂直式热处理装置，其可以通过采用简单的结构，防止由于诸如地震的外力而放置在隔热安装座上的船的下落，同时采取这样的形式 被称为双船系统。 立式热处理装置包括：加热炉5，其底部形成有炉口5a，适于关闭炉口5a的盖17，一对基板保持工具4， 通过隔热安装件19在盖17上，并且适于以多级方式保持多个基板W;旋转机构20，设置在盖17上并适于旋转基板保持工具4;以及升降机构18，其适于升高和 降下盖子17，以便相对于炉子5携带和执行基板保持工具4.当基板保持工具4中的一个位于炉子5中时，另一个基板保持工具4被放置在工作台22上 ，用于装载基板。 每个基板保持工具4由于承载机构23而被承载在工作台22和隔热安装件19之间。锁定部分25和被锁定的部分26设置在每个基板保持工具4的底部，并且上部 绝热安装件19的一部分，使得锁定部25和被锁定的部分26可以通过旋转机构20将隔热安装件19旋转预定角度而彼此接合，同时基板保持 由于载体机构23，工具4保持在隔热安装件19的正上方。