Phenolic novolak resins, cured substances therefrom and method for
production thereof
    1.
    发明授权
    Phenolic novolak resins, cured substances therefrom and method for production thereof 失效
    酚醛树脂,其固化物及其生产方法

    公开(公告)号:US5155202A

    公开(公告)日:1992-10-13

    申请号:US651361

    申请日:1991-02-06

    CPC分类号: C08L63/04 C08G59/08 C08G8/08

    摘要: A phenolic novolak resin comprising a compound represented by the general formula [I]: ##STR1## wherein X is H or ##STR2## R is an alkyl group having 1 to 4 carbon atoms, and n is 1 to 10, particularly a phenolic novolak epoxy resin, and material, and a cured substance therefrom, and a process for producing the resin are disclosed. This resin is excellent in heat resistance and in reluctance to absorb water as compared with conventional phenolic resins, and useful in sealing electronic parts, molding, and laminating.

    摘要翻译: PCT No.PCT / JP90 / 00798 Sec。 371日期1991年2月6日 102(e)日期1991年2月6日PCT Filed 1990年6月19日PCT公布。 第WO90 / 15832号公报 日本1990年12月27日。一种酚醛清漆树脂,其包含由通式[I]表示的化合物:其中X为H或R为具有1至4个碳原子的烷基, n为1〜10,特别是酚醛清漆型环氧树脂,其材料及其固化物,以及该树脂的制造方法。 与以往的酚醛树脂相比,该树脂的耐热性和耐吸水性优异,可用于密封电子部件,成型和层压。

    Method for stabilizing unsaturated cycloacetal resin
    3.
    发明授权
    Method for stabilizing unsaturated cycloacetal resin 失效
    用于稳定不饱和环己基树脂的方法

    公开(公告)号:US4081591A

    公开(公告)日:1978-03-28

    申请号:US694999

    申请日:1976-06-11

    摘要: This invention relates to a method for stabilizing unsaturated cycloacetal resin produced by reacting (I) cycloacetal compound prepared by the condensation of polyhydric alcohol more than tri-hydric and unsaturated aldehyde, with (II) unsaturated alcohol having a radical-polymerizable unsaturated bond and an alcoholic hydroxyl group in the same molecule, and optionally further with one or more compounds selected from the group consisting of polyhydric alcohol, hydroxy polyether and hydroxy polyester, in the presence of acid catalyst, characterized by adding one or more compounds selected from the group consisting of ammonia, primary amine, secondary amine, tertiary amine, quaternary ammonium salt, hydrazine and its derivatives in an amount of 0.01 to 5 parts by weight per 100 parts by weight of the produced unsaturated cycloacetal resin during the reaction of producing the unsaturated cycloacetal resin and/or after the reaction and maintaining pH of the unsaturated cycloacetal resin (pH of a 50% methyl alcohol solution of the resin) at more than 4.