公开(公告)号：US20110200953A1

公开(公告)日：2011-08-18

申请号：US13025490

申请日：2011-02-11

申请人： Hiroshi ARIMA ,  Kousuke YOSHIHARA ,  Yuichi YOSHIDA ,  Yasushi TAKIGUCHI ,  Taro YAMAMOTO

发明人： Hiroshi ARIMA ,  Kousuke YOSHIHARA ,  Yuichi YOSHIDA ,  Yasushi TAKIGUCHI ,  Taro YAMAMOTO

IPC分类号： G03F7/30 ,  G03B27/52

CPC分类号： G03F7/3021

摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.

摘要翻译： 提供了能够实现高产量的显影装置。 显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。 可以停止抗蚀剂与显影液的反应。 因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。