公开(公告)号：US5348837A

公开(公告)日：1994-09-20

申请号：US12479

申请日：1993-02-02

申请人： Hiroshi Fukuda ,  Ryoko Yamanaka ,  Tsutomu Tawa ,  Tsuneo Terasawa ,  Seiji Yonezawa

发明人： Hiroshi Fukuda ,  Ryoko Yamanaka ,  Tsutomu Tawa ,  Tsuneo Terasawa ,  Seiji Yonezawa

IPC分类号： G03F7/20 ,  G03C5/00

CPC分类号： G03F7/70066 ,  G03F7/2002 ,  G03F7/701 ,  G03F7/70191 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70375 ,  G03F7/70891

摘要： A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.

摘要翻译： 投影曝光装置具有有效的源，掩模，投影透镜和滤光器。 掩模被来自有源光的光线照射，具有大致环形的照明分布。 滤光器设置在投影透镜的光瞳面的近似位置。 在光瞳面上，使第一区域的透射率低于第二区域的透射率，第一区域在与具有环状照明分布的有效源基本共轭的环状区域的周围的内侧，第二区域在外部 的周边。 以这种方式构建，该装置形成精细图案，其单位尺寸至少与所使用的光的波长一样小，同时保持较高的对比度值和较高的焦距水平。