公开(公告)号：US07050710B2

公开(公告)日：2006-05-23

申请号：US10491432

申请日：2002-10-22

申请人： Hiroshi Shinya ,  Yasutaka Souma ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Yasutaka Souma ,  Takahiro Kitano

IPC分类号： F26B19/00

CPC分类号： H01L21/67109

摘要： A heat treatment apparatus configured to perform heat treatment on a wafer having a surface on which a coating film is formed, and includes: a holding member for holding the wafer almost horizontally; a chamber for housing the wafer held by the holding member; a hot plate having gas permeability and disposed above the wafer held by the holding member in the chamber so that the coating film formed on the wafer can be directly heated; and an exhaust port provided on the top face of the chamber and exhausting gas in the chamber. Gas generated from the coating film passes through the hot plate and is exhausted from the chamber. Accordingly, uniformity of a coating film is improved. As a result, CD uniformity may be improved, LER characteristics may be improved, and a smooth pattern side face may be obtained.

摘要翻译： 一种热处理设备，被配置为对具有形成有涂膜的表面的晶片进行热处理，并且包括：用于保持晶片几乎水平的保持构件; 用于容纳由保持构件保持的晶片的室; 具有透气性的热板，并且设置在由所述保持构件保持在所述室中的所述晶片上方，使得可以直接加热形成在所述晶片上的涂膜; 以及设置在所述室的顶面上并在所述室中排出气体的排气口。 从涂膜产生的气体通过热板并从室排出。 因此，涂膜的均匀性提高。 结果，可以提高CD均匀性，可以提高LER特性，并且可以获得平滑的图案侧面。

公开(公告)号：US07891365B2

公开(公告)日：2011-02-22

申请号：US11802423

申请日：2007-05-22

申请人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

发明人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

IPC分类号： B08B3/04

CPC分类号： H01L21/67051 ,  B05B15/55 ,  B05B15/555 ,  B05B15/557

摘要： Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

摘要翻译： 公开了一种喷嘴清洁装置和喷嘴清洁方法，其能够以简单的结构和低成本有效地清洁用于将处理液体排放到基板的喷嘴。 喷嘴30容纳在具有漏斗形部分2b的清洁容器2中。 作为清洗液的溶剂T沿着漏斗状部2b的内表面供给。 溶剂T形成围绕喷嘴30旋转的涡流。通过将喷嘴30暴露于涡流，可以有效地彻底清洁喷嘴30。

公开(公告)号：US20080023034A1

公开(公告)日：2008-01-31

申请号：US11802423

申请日：2007-05-22

申请人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

发明人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

IPC分类号： B08B3/08 ,  B08B3/04 ,  B08B3/10 ,  B08B5/00 ,  G05B15/00

CPC分类号： H01L21/67051 ,  B05B15/55 ,  B05B15/555 ,  B05B15/557

摘要： Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

摘要翻译： 公开了一种喷嘴清洁装置和喷嘴清洁方法，其能够以简单的结构和低成本有效地清洁用于将处理液体排放到基板的喷嘴。 喷嘴30容纳在具有漏斗形部分2b的清洁容器2中。 作为清洗液的溶剂T沿漏斗形部分2b的内表面供应。 溶剂T形成围绕喷嘴30旋转的涡流。 通过将喷嘴30暴露于涡流，可以有效地彻底地清洁喷嘴30。

公开(公告)号：US08562753B2

公开(公告)日：2013-10-22

申请号：US12974160

申请日：2010-12-21

申请人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

发明人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  B05B15/55 ,  B05B15/555 ,  B05B15/557

摘要： Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

摘要翻译： 公开了一种喷嘴清洁装置和喷嘴清洗方法，其能够有效地清洁用于将处理液体排放到基板的喷嘴。 喷嘴30容纳在具有漏斗形部分2b的清洁容器2中。 作为清洗液的溶剂T沿着漏斗状部2b的内表面供给。 溶剂T形成围绕喷嘴30旋转的涡流。通过将喷嘴30暴露于涡流，可以有效地彻底清洁喷嘴30。

公开(公告)号：US20110083702A1

公开(公告)日：2011-04-14

申请号：US12974103

申请日：2010-12-21

申请人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

发明人： Takeshi Hirao ,  Akihiro Fujimoto ,  Yasutaka Souma

IPC分类号： B08B9/027

CPC分类号： H01L21/67051 ,  B05B15/55 ,  B05B15/555 ,  B05B15/557

摘要： Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate, with a simple structure and a low cost. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.