公开(公告)号：US20140022540A1

公开(公告)日：2014-01-23

申请号：US13945285

申请日：2013-07-18

Applicant: Hitachi High -Technologies Corporation

Inventor： Ryoji ASAKURA ,  Kenji TAMAKI ,  Akira KAGOSHIMA ,  Daisuke SHIRAISHI ,  Toshio MASUDA

IPC: G01J1/42

CPC classification number: G01J1/42 ,  G01J3/443 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972

Abstract: Among the multiple OES data wavelengths, an analysis device identifies the wavelength of light emissions from a substance contained in the plasma from among multiple light emission wavelengths within the chamber by way of the steps of: measuring the light emission within the chamber during etching processing of the semiconductor wafer; finding the time-based fluctuation due to changes over time on each wavelength in the measured intensity of the light emissions in the chamber; comparing the time-based fluctuations in the wavelength of the light emitted from the pre-specified substance; and by using the comparison results, identifying the wavelength of the light emitted from the substance caused by light emission within the chamber.

Abstract translation: 在多个OES数据波长中，分析装置通过以下步骤来识别来自腔室内的多个发光波长的等离子体中包含的物质的光发射的波长：在蚀刻处理期间测量腔室内的光发射 半导体晶片; 发现由于室内光发射强度的每个波长随时间的变化引起的时间波动; 比较从预先指定的物质发射的光的波长的基于时间的波动; 并且通过使用比较结果，识别由室内的发光引起的从物质发射的光的波长。

公开(公告)号：US20150279129A1

公开(公告)日：2015-10-01

申请号：US14625466

申请日：2015-02-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Masayoshi ISHIKAWA ,  Hideaki SUZUKI ,  Tomoaki HIRUTA ,  Toshio MASUDA ,  Ken KIKEGAWA

IPC: G07C5/08 ,  B60K35/00 ,  G06Q10/00

CPC classification number: G07C5/0808 ,  B60K35/00 ,  G05B23/0281 ,  G06Q10/20

Abstract: Selection of sensors requires the knowledge of individual sensors mounted on a target machine and the knowledge of mechanical features of the machine. In the past, experts having mechanical knowledge selected the sensors. The present invention involves analyzing sensor data at e of machine failure, extracting features from the sensor data regarding each failure cause, and comparing the extracted features so as to clarify the difference between the sensor data about the failure causes and present an operator with the clarified difference thereby to support sensor selection. The invention makes it possible to select more simply than before the sensors considered effective for classifying failure causes. For example, the sensors deemed effective for classifying failure causes without mechanical knowledge can be selected.

Abstract translation: 传感器的选择需要知道安装在目标机器上的各个传感器以及机器机械特性的知识。 过去，拥有机械知识的专家选择了传感器。 本发明涉及在机器故障的e处分析传感器数据，从传感器数据中提取关于每个故障原因的特征，并比较所提取的特征，以便澄清关于故障原因的传感器数据之间的差异，并向操作者呈现澄清 差异从而支持传感器选择。 本发明使得可以比在认为对分类故障原因有效的传感器之前更简单地进行选择。 例如，可以选择对于没有机械知识来分类故障原因的有效传感器。

公开(公告)号：US20150276557A1

公开(公告)日：2015-10-01

申请号：US14671042

申请日：2015-03-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshio MASUDA ,  Mutsuki KOGA ,  Hideo NISHIKAWA ,  Junichi KOKUMA ,  Nobuyoshi TADA

IPC: G01M99/00

CPC classification number: G01M99/008 ,  G05B23/0243

Abstract: A state monitoring system enabling a sign of abnormality of equipment to be detected is disclosed, which includes: a storage unit to be stored with normal models obtained by analyzing, per series of manipulations, time-series learning data of sensor outputs indicated by respective units of processing equipment when normally finishing processing a raw material through the series of manipulations according to a default sequence; and a processing unit to diagnose a state of the processing equipment on the occasion of processing a specified raw material, upon an input of time-series evaluation data of the sensor output indicated by each of the units of the processing equipment on the occasion of finishing processing the specified raw material through the series of manipulations, on the basis of a comparison between the inputted data and the normal model.

Abstract translation: 公开了一种能够检测设备异常的状态监视系统，其包括：存储单元，用于存储与通过分析每个系列操作获得的正常模型的各单元所指示的传感器输出的时间序列学习数据 的处理设备，当根据默认顺序通过一系列操作正常地处理原料时; 以及处理单元，用于在处理指定的原材料时诊断处理设备的状态，在输入由处理设备的每个单元指示的传感器输出的时间序列评估数据 基于输入数据与正常模型之间的比较，通过一系列操作来处理指定的原材料。

公开(公告)号：US20150278325A1

公开(公告)日：2015-10-01

申请号：US14670933

申请日：2015-03-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshio MASUDA ,  Yoshiyuki NAKAYAMA ,  Tadashi SUZUKI ,  Tojiro NODA

IPC: G06F17/30

CPC classification number: G06F16/27 ,  G08C25/00 ,  H04Q9/00 ,  H04Q2209/823

Abstract: The information processing apparatus includes a receiving unit for receiving from a transmission-side information processing apparatus data extracted from a set of data of a plurality of attributes acquired in time series from a monitoring target and a reception data processing unit for setting, when a set of the received data includes a value-unfilled attribute, a value being latest among known values of the attribute included in previously received time-series sets of data, as a value of the value-unfilled attribute.

Abstract translation: 信息处理装置包括：接收单元，用于从发送侧信息处理设备接收从监视对象以时间序列获取的多个属性的数据集提取的数据;以及接收数据处理单元， 接收到的数据包括值未填充属性，作为值未填充属性的值的值，其是包括在先前接收的时间序列数据集合中的属性的已知值的最新值。