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公开(公告)号:US20230059414A1
公开(公告)日:2023-02-23
申请号:US17795367
申请日:2020-02-05
Applicant: Hitachi High-Tech Corporation
Inventor: Hiroshi OINUMA , Kazuki IKEDA , Wen LI , Masashi WADA
Abstract: A method of setting a parameter of a charged particle beam device, for shortening the time required to adjust an ABCC parameter. An inverse conversion processing unit generates a simulator input signal corresponding to an electron emitted from a sample. A simulation detector uses an arithmetic model that simulates a detector and executes arithmetic processing on the simulator input signal in a state in which characteristic information is reflected in an arithmetic parameter. A simulated image conversion unit executes arithmetic processing corresponding to an image conversion unit and converts a signal from the simulation detector into a simulated image. An ABCC search unit searches for an ABCC parameter with respect to the simulation detector so that an evaluation value obtained from the simulated image becomes a specified reference value, and outputs the ABCC parameter as a search result to an ABCC control unit of the actual machine.
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公开(公告)号:US20220246392A1
公开(公告)日:2022-08-04
申请号:US17587935
申请日:2022-01-28
Applicant: Hitachi High-Tech Corporation
Inventor: Akio YAMAMOTO , Wen LI , Hiroshi OINUMA , Shunsuke MIZUTANI
IPC: H01J37/244 , H01J37/28 , H01J37/26 , H01J37/22
Abstract: Provided is a charged particle beam device and a charged particle beam device calibration method capable of correcting an influence of characteristic variation and noise with high accuracy. Control units execute a first calibration of correcting a characteristic variation between a plurality of channels in detectors and signal processing circuits by using a setting value of a control parameter for each of the plurality of channels in a state in which a primary electron beam is not emitted. The control units further execute a second calibration of correcting a characteristic variation between the plurality of channels in scintillators or the like by using the setting value of the control parameter for each of the plurality of channels in a state in which the primary electron beam is emitted.
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