公开(公告)号：US20220157576A1

公开(公告)日：2022-05-19

申请号：US16957033

申请日：2019-07-29

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Taku Iwase ,  Masakazu Isozaki ,  Kenetsu Yokogawa ,  Masahito Mori ,  Junichi Sayama

IPC: H01J37/32

Abstract: In order to be able to independently control a plasma density distribution both in a distribution with high center and a nodal distribution, and perform a plasma processing on a sample with higher accuracy for processing uniformity, a plasma processing apparatus includes: a vacuum vessel in which a plasma processing is performed on a sample; a radio frequency power source configured to supply radio frequency power for generating plasma; a sample stage on which the sample is placed; and a magnetic field forming unit configured to form a magnetic field inside the vacuum vessel and disposed outside the vacuum vessel, in which the magnetic field forming unit includes: a first coil; a second coil that is disposed closer to an inner side than the first coil and has a diameter smaller than a diameter of the first coil; a first yoke that covers the first coil, and an upper side and a side surface of the vacuum vessel, and in which the first coil is disposed; and a second yoke that covers the second coil along a peripheral direction of the second coil and has an opening below the second coil.

公开(公告)号：US10825657B2

公开(公告)日：2020-11-03

申请号：US15755338

申请日：2017-03-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Kenetsu Yokogawa ,  Masakazu Isozaki ,  Masahito Mori

IPC: H01J37/32

Abstract: A plasma processing apparatus with improved yield, adapted to include a vacuum container, a processing chamber disposed inside thereof, and in which a plasma is formed, a sample table disposed in the processing chamber and on which a sample is placed, two electrodes which have a film shape, disposed within the sample table, and to which power for attracting the sample is supplied so that different polarities are formed, a coiled portion in which two power supply lines are wound in parallel around the same axis, and a bypass line which connects the two power supply lines between the coiled portion and the two electrodes and has a capacitor.

公开(公告)号：USD891636S1

公开(公告)日：2020-07-28

申请号：US29688724

申请日：2019-04-24

Applicant: Hitachi High-Tech Corporation

Designer： Masakazu Isozaki ,  Masahito Mori ,  Kenetsu Yokogawa ,  Takao Arase ,  Taku Iwase