公开(公告)号：US20230290606A1

公开(公告)日：2023-09-14

申请号：US18013952

申请日：2020-07-07

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke ABE ,  Yusuke NAKAMURA ,  Shunsuke MIZUTANI ,  Muneyuki FUKUDA

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/24 ,  H01J37/244

CPC classification number: H01J37/147 ,  H01J37/14 ,  H01J37/241 ,  H01J37/244

Abstract: Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.

公开(公告)号：US20220351938A1

公开(公告)日：2022-11-03

申请号：US17702343

申请日：2022-03-23

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke NAKAMURA ,  Yusuke ABE ,  Kenji TANIMOTO ,  Takeyoshi OHASHI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

Abstract: An object of the invention is to acquire a high-quality image while maintaining an improvement in throughput of image acquisition (measurement (length measurement)). The present disclosure provides a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.

公开(公告)号：US20240371601A1

公开(公告)日：2024-11-07

申请号：US18775180

申请日：2024-07-17

Applicant: Hitachi High-Tech Corporation

Inventor： Yusuke NAKAMURA ,  Yusuke ABE ,  Kenji TANIMOTO ,  Takeyoshi OHASHI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

Abstract: A high-quality image is acquired while maintaining an improvement in throughput of image acquisition (measurement (length measurement)) in a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.