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1.发明公开公开(公告)号：US20230274417A1
公开(公告)日：2023-08-31
申请号：US18315046
申请日：2023-05-10
Applicant: Hitachi High-Tech Corporation
Inventor： Heita KIMIZUKA , Yohei NAKAMURA , Natsuki TSUNO , Muneyuki FUKUDA
IPC: G06T7/00
CPC classification number: G06T7/001 , G06T2207/30148 , G06T2207/10152
Abstract: An object of the present disclosure is to provide a system for deriving a type of defect of a semiconductor element and a non-transitory computer-readable medium. The system receives, from the image acquisition tool, image data obtained by sequentially irradiating a plurality of patterns provided on the semiconductor wafer with a beam and extracts characteristics of the plurality of patterns sequentially irradiated with a beam from the received image data, the characteristics being included in the image data, or receives characteristics of the plurality of patterns sequentially irradiated with a beam from the image acquisition tool, the characteristics being extracted from the image data (Step 603), and derives (Step 605) a type of a defect by referring to (Step 604) related information for the characteristics of the plurality of patterns, the related information storing the characteristics of the plurality of patterns and types of defects in association with each other.
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公开(公告)号：US20230170182A1
公开(公告)日：2023-06-01
申请号：US17921737
申请日：2020-04-28
Applicant: Hitachi High-Tech Corporation
Inventor： Kazufumi YACHI , Muneyuki FUKUDA , Ichiro TACHIBANA , Hiroya OHTA
IPC: H01J37/28 , H01J37/244 , H01J37/145
CPC classification number: H01J37/28 , H01J37/145 , H01J37/244 , H01J2237/057 , H01J2237/2806
Abstract: Proposed is a charged particle beam apparatus for the purpose of detecting a charged particle emitted from a sample in a specific direction by discriminating between the charged particle and a charged particle emitted in another direction. As one aspect of achieving the above purpose, proposed is a charged particle beam apparatus including an objective lens configured to focus a beam emitted from a charged particle source, a detector (8) configured to detect at least one of a first charged particle (23) emitted from a sample by irradiating the sample with the beam and a second charged particle emitted from a charged particle collided member by causing the first charged particle to collide with the charged particle collision member disposed on a trajectory of the first charged particle, and an electrostatic lens (12) including a plurality of electrodes disposed between the objective lens and the detector, in which the electrostatic lens is a Butler type.
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公开(公告)号：US20220130027A1
公开(公告)日：2022-04-28
申请号：US17296421
申请日：2019-02-15
Applicant: Hitachi High-Tech Corporation
Inventor： Muneyuki FUKUDA , Yasutaka TOYODA , Ryou YUMIBA , Shuyang DOU , Ayumi DOI , Junichi TANAKA
Abstract: The present disclosure relates to a system and a non-transitory computer-readable medium for estimating the height of foreign matter, etc. adhering to a sample. In order to achieve the abovementioned purpose, proposed is a system, etc. in which data acquired by a charged particle beam device or features extracted from the data are input to a learning model, which is provided with, in an intermediate layer thereof, a parameter learned using teacher data having data acquired by the charged particle beam device or features extracted from the data as inputs and having the heights or depths of the structures of samples or of foreign matter on the samples as outputs, and height or depth information is output.
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公开(公告)号：US20210027981A1
公开(公告)日：2021-01-28
申请号：US17040141
申请日：2018-04-25
Applicant: Hitachi High-Tech Corporation
Inventor： Heita KIMIZUKA , Natsuki TSUNO , Muneyuki FUKUDA , Katsura TAKAGUCHI
IPC: H01J37/22 , H01J37/28 , H01J37/147 , H01J37/244
Abstract: The purpose of the present disclosure is to propose a charged particle beam device capable of allowing specifying of a distance between irradiation points for a pulsed beam and a time between irradiation points. Proposed is a charged particle beam device equipped with a beam column which has a scanning deflector for sweeping a beam and directs the beam swept by the scanning deflector onto a sample in pulses, wherein: the distance between irradiation points of the pulsed beam is set such that feature quantities of one or more specific regions of an image obtained on the basis of an output of a detector satisfy a predetermined state; the duration of time between irradiation points for the pulsed beam is changed when in a state in which the set distance between irradiation points is set or in a state in which multiple distances between irradiation points determined on the basis of the specified distance between irradiation points are set; and the beam emission is carried out according to the duration of time between irradiation points whereby the feature quantities of the multiple specific regions of the image obtained on the basis of the output of the detector satisfy the predetermined state.
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公开(公告)号：US20240280520A1
公开(公告)日：2024-08-22
申请号：US18569860
申请日：2021-07-28
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi HIROI , Yuko OTANI , Yuya ISOMAE , Muneyuki FUKUDA , Masakazu KANEZAWA
IPC: G01N23/2251
CPC classification number: G01N23/2251 , G01N2223/401 , G01N2223/6116
Abstract: The purpose of the present disclosure is to provide a technology which enables, in a step for analyzing a defect of an element, identification of the position of the defect even in a case where the defect is thin or there is an influence of contamination. An inspection apparatus according to the present disclosure irradiates a first region including a defect of a sample with a low-energy first electron beam and then generates a second electron beam image obtained by irradiating a second region including the first region with a high-energy second electron beam, and identifies the position of the first region in the second electron beam image, thereby identifying the position of the defect.
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Patent Agency Ranking
公开(公告)号：US20230290606A1
公开(公告)日：2023-09-14
申请号：US18013952
申请日：2020-07-07
Applicant: Hitachi High-Tech Corporation
Inventor： Yusuke ABE , Yusuke NAKAMURA , Shunsuke MIZUTANI , Muneyuki FUKUDA
IPC: H01J37/147 , H01J37/14 , H01J37/24 , H01J37/244
CPC classification number: H01J37/147 , H01J37/14 , H01J37/241 , H01J37/244
Abstract: Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.
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公开(公告)号：US20210327048A1
公开(公告)日：2021-10-21
申请号：US17285368
申请日：2019-09-09
Applicant: Hitachi High-Tech Corporation
Inventor： Heita KIMIZUKA , Natsuki TSUNO , Muneyuki FUKUDA
Abstract: The present disclosure hereinafter proposes a charged particle beam device and a method for adjusting a charged particle beam device which aim to appropriately set device conditions independently of a state of a sample. The present disclosure proposes a method and a system for adjusting contrast and brightness of an image, comprising: adjusting offset (step 112) of a signal processing device of the charged particle beam device so that the brightness of a pattern in an image obtained by scanning with a first charged particle beam (first intermittent condition beam) becomes a predetermined value; and adjusting a gain (step 114) of the signal processing device so that the brightness of a pattern in an image obtained by scanning with a second charged particle beam, which is a pulse beam (second intermittent condition beam) different from the first charged particle beam in at least one of irradiation time, irradiation distance, interval time between irradiation points, and distance between irradiation points, becomes a predetermined value.
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公开(公告)号：US20210391140A1
公开(公告)日：2021-12-16
申请号：US17330500
申请日：2021-05-26
Applicant: Hitachi High-Tech Corporation
Inventor： Yohei MINEKAWA , Kohei CHIBA , Muneyuki FUKUDA , Takanori KISHIMOTO
Abstract: Provided is a technique capable of achieving both throughput and robustness for a function of adjusting brightness (B) and contrast (C) of a captured image in a charged particle beam device. The charged particle beam device includes a computer system having a function (ABCC function) of adjusting the B and the C of an image obtained by imaging a sample. The computer system determines whether adjustment is necessary based on a result obtained by evaluating a first image obtained by imaging an imaging target of the sample (step S2), executes, when the adjustment is necessary based on a result of the determination, the adjustment on a second image of the imaging target to set an adjusted B value and an adjusted C value (step S4), and captures a third image of the imaging target based on the adjusted setting values to generate an image for observation (step S5).
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公开(公告)号：US20210249221A1
公开(公告)日：2021-08-12
申请号：US17049353
申请日：2018-04-26
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor： Nobuhiro OKAI , Daisuke BIZEN , Tomoyasu SHOJO , Naomasa SUZUKI , Muneyuki FUKUDA
IPC: H01J37/244 , H01J37/147 , H01J37/12 , H01J37/28
Abstract: To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.
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10.发明申请公开(公告)号：US20210042900A1
公开(公告)日：2021-02-11
申请号：US16904309
申请日：2020-06-17
Applicant: Hitachi High-Tech Corporation
Inventor： Heita KIMIZUKA , Yohei NAKAMURA , Natsuki TSUNO , Muneyuki FUKUDA
IPC: G06T7/00
Abstract: An object of the present disclosure is to provide a system for deriving a type of a defect of a semiconductor element and a non-transitory computer-readable medium. The system receives, from the image acquisition tool, image data obtained by sequentially irradiating a plurality of patterns provided on the semiconductor wafer with a beam and extracts characteristics of the plurality of patterns sequentially irradiated with abeam from the received image data, the characteristics being included in the image data, or receives characteristics of the plurality of patterns sequentially irradiated with a beam from the image acquisition tool, the characteristics being extracted from the image data (Step 603), and derives (Step 605) a type of a defect by referring to (Step 604) related information for the characteristics of the plurality of patterns, the related information storing the characteristics of the plurality of patterns and types of defects in association with each other.
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