公开(公告)号：US20230317406A1

公开(公告)日：2023-10-05

申请号：US18127864

申请日：2023-03-29

Applicant: Hitachi High-Tech Corporation

Inventor： Yuto KAWASHIMA ,  Satoru YAMAGUCHI ,  Yasunori TAKASUGI

IPC: H01J37/21 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/216 ,  H01J2237/24578 ,  H01J37/1472

Abstract: A charged particle beam system that improves throughput by applying an approximate expression created using a wafer to be actually measured is provided. The invention is directed to a charged particle beam system including a charged particle beam device that includes a detector configured to detect a signal particle obtained by irradiating a sample with a charged particle beam and a computer system that controls an operation of the charged particle beam device, in which the computer system executes a process of performing autofocus on each of a plurality of peripheral AF points set in the sample and outside a measurement area, and acquiring focus information of the plurality of AF points, a process of approximating focus distribution within the measurement area based on the focus information of the plurality of peripheral AF points, and a process of measuring each measurement point within the measurement area of the same sample as the sample from which the focus information is acquired, using the approximated focus distribution.