公开(公告)号：US20190287825A1

公开(公告)日：2019-09-19

申请号：US16353513

申请日：2019-03-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Keiichi TANAKA

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/3065 ,  H01L21/683 ,  H01L21/311 ,  H01L21/3213

Abstract: According to one embodiment, a plasma processing apparatus includes: a vacuum container; a sample stage on which a sample is mounted in an interior of the vacuum container; an exhaust unit which exhausts the interior of the vacuum container; a gas supply unit which supplies a processing gas to the interior of the vacuum container; a high frequency power application unit which applies a high frequency power to the interior of the vacuum container; an irradiation unit which irradiates the sample mounted on the sample stage with infrared light from an outside of the vacuum container; and a control unit which controls the exhaust unit, the gas supply unit, the high frequency power application unit, the irradiation unit, and a temperature measurement unit which measures a temperature of a surface of the sample stage on which the sample is mounted. The control unit controls an intensity of the infrared light with which the irradiation unit irradiates the sample based on the temperature measured by the temperature measurement unit when the irradiation unit irradiates the sample mounted on the sample stage with the infrared light.

公开(公告)号：US20210366791A1

公开(公告)日：2021-11-25

申请号：US16495369

申请日：2018-11-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Keiichi TANAKA

IPC: H01L21/66 ,  H01L21/3065 ,  H01J37/32

Abstract: There is provided a sample processing method including: an adsorption step forming a reactant layer on a sample surface inside a processing chamber in a state where plasma is generated by a plasma generation unit in a plasma generation chamber connected to the processing chamber; a desorption step of desorbing the reactant layer from the surface of the sample by heating the sample with a heating lamp disposed outside the processing chamber and a heater disposed inside the sample stage; a cooling step of cooling the sample heated in the desorption step; and repeating the above steps a plurality of times, wherein in the adsorption step, a control unit performs feed-forward control over the heating lamp and the heater to set the sample to a first temperature state, and in the desorption step, the heater is subjected to feed-back control to set the sample to a second temperature state.